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1. (WO2018142036) PLASMA SOURCE
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Pub. No.: WO/2018/142036 International Application No.: PCT/FR2017/053798
Publication Date: 09.08.2018 International Filing Date: 21.12.2017
IPC:
H05H 1/46 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
46
using applied electromagnetic fields, e.g. high frequency or microwave energy
Applicants:
POLYGON PHYSICS [FR/FR]; 30 Chemin de Rochasson 38240 MEYLAN, FR
Inventors:
SORTAIS, Pascal; FR
Agent:
CABINET BEAUMONT; 4, Place Robert Schuman B.P. 1529 38025 Grenoble Cedex 1, FR
Priority Data:
175097806.02.2017FR
Title (EN) PLASMA SOURCE
(FR) SOURCE DE PLASMA
Abstract:
(EN) The invention relates to a plasma source comprising a quarter-wave antenna (204) arranged in a cylindrical housing (202) provided with an opening (208) facing the end of the antenna (204), in which: the diameter (d) of the antenna (204) measures between a third and a quarter of the inner diameter (d1) of the housing (202), and the distance (l) between the end of the antenna (204) and the opening (208) measures between 2/3 and 5/3 of the diameter (d) of the antenna (204).
(FR) L'invention concerne une source de plasma comprenant une antenne (204) quart d'onde située dans une enceinte cylindrique (202) munie d'une ouverture (208) en face de l'extrémité de l'antenne (204), dans laquelle : le diamètre (d) de l'antenne (204) est compris entre le tiers et le quart du diamètre (d) interne de l'enceinte (202), la distance (l) entre l'extrémité de l'antenne (204) et l'ouverture (208) est comprise entre 2/3 et 5/3 du diamètre (d) de l'antenne (204).
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: French (FR)
Filing Language: French (FR)