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Pub. No.: WO/2018/141713 International Application No.: PCT/EP2018/052211
Publication Date: 09.08.2018 International Filing Date: 30.01.2018
IPC:
G03F 9/00 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
9
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants: ASML NETHERLANDS B.V.[NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors: KANEHARA, Junichi; NL
Agent: RAS, Michael; NL
Priority Data:
17154551.003.02.2017EP
17169025.802.05.2017EP
17193990.329.09.2017EP
17201092.810.11.2017EP
Title (EN) EXPOSURE APPARATUS
(FR) APPAREIL D'EXPOSITION
Abstract:
(EN) There is provided an exposure apparatus comprising a first substrate holder, a second substrate holder, a sensor holder, a projection system, a measurement device and a further measurement device. The first substrate holder is configured to hold a substrate. The second substrate holder is configured to hold the substrate. The sensor holder is configured to hold a sensor. The projection system is configured to expose the substrate with an exposure beam. The measurement device is configured to provide measurement information of the substrate. The further measurement device is configured to provide further measurement information of the substrate. The sensor is configured to measure a property of the exposure beam and/or the projection system. The projection system is configured to expose the sensor with the exposure beam.
(FR) L'invention concerne un appareil d'exposition comprenant un premier support de substrat, un second support de substrat, un support de capteur, un système de projection, un dispositif de mesure et un autre dispositif de mesure. Le premier support de substrat est configuré pour maintenir un substrat. Le second support de substrat est configuré pour maintenir le substrat. Le support de capteur est configuré pour maintenir un capteur. Le système de projection est configuré pour exposer le substrat à un faisceau d'exposition. Le dispositif de mesure est configuré pour fournir des informations de mesure du substrat. L'autre dispositif de mesure est configuré pour fournir d'autres informations de mesure du substrat. Le capteur est configuré pour mesurer une propriété du faisceau d'exposition et/ou du système de projection. Le système de projection est configuré pour exposer le capteur au faisceau d'exposition.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)