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1. (WO2018141520) LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD

Pub. No.:    WO/2018/141520    International Application No.:    PCT/EP2018/050602
Publication Date: Fri Aug 10 01:59:59 CEST 2018 International Filing Date: Fri Jan 12 00:59:59 CET 2018
IPC: G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: BUTLER, Hans
WIJCKMANS, Maurice, Willem, Jozef, Etiënne
Title: LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD
Abstract:
The present invention relates to a lithographic apparatus, comprising: - a projection system configured to project a patterned radiation beam onto a substrate, comprising optical elements, - a sensor frame, - a first position measurement system configured to measure a position of an optical element relative to the sensor frame, comprising a sensor adapted to monitor an optical element, with a sensor element mounted to the sensor frame, - a sensor frame support supporting the sensor frame on a reference, - a force measurement device adapted to generate force measurement data relating to force exerted on the sensor frame by the sensor frame support, - a position control device adapted to control the relative position of the substrate and the patterned radiation beam wherein the position control device is configured to receive the force measurement data and to control said relative position based on at least the force measurement data.