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1. (WO2018141503) METROLOGY METHOD AND APPARATUS AND ASSOCIATED COMPUTER PRODUCT

Pub. No.:    WO/2018/141503    International Application No.:    PCT/EP2018/050344
Publication Date: Fri Aug 10 01:59:59 CEST 2018 International Filing Date: Tue Jan 09 00:59:59 CET 2018
IPC: G03F 7/20
G01N 21/47
H01L 21/66
G01N 21/956
Applicants: ASML NETHERLANDS B.V.
Inventors: URBANCZYK, Adam, Jan
VAN DER LAAN, Hans
DA COSTA ASSAFRAO, Alberto
TSENG, Chien-Hung
CHEN, Jay, Jianhui
Title: METROLOGY METHOD AND APPARATUS AND ASSOCIATED COMPUTER PRODUCT
Abstract:
Disclosed is a process monitoring method, and an associated metrology apparatus. The method comprises: comparing (1020) measured target response spectral sequence data (1010) relating to the measurement response of actual targets (1000) to equivalent reference target response sequence data (1030) relating to a measurement response of the targets as designed; and performing (1040) a process monitoring action based on the comparison of said measured target response sequence data and reference target response sequence data. The method may also comprise determining (1050) stack parameters from the measured target response spectral sequence data and reference target response spectral sequence data.