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1. (WO2018141121) LIQUID CRYSTAL PANEL, PHOTORESIST PATTERN FORMING METHOD THEREFOR

Pub. No.:    WO/2018/141121    International Application No.:    PCT/CN2017/075930
Publication Date: Fri Aug 10 01:59:59 CEST 2018 International Filing Date: Thu Mar 09 00:59:59 CET 2017
IPC: G02F 1/1335
G03F 7/00
Applicants: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
武汉华星光电技术有限公司
Inventors: GONG, Chengbo
龚成波
Title: LIQUID CRYSTAL PANEL, PHOTORESIST PATTERN FORMING METHOD THEREFOR
Abstract:
A liquid crystal panel and a photoresist pattern forming method therefor. The method comprises: coating a photoresist material layer on a substrate (100) (S100); providing a masking layer having a pattern on the photoresist material layer (S300); and exposing the masking layer to light to form a photoresist pattern on the photoresist material layer (S400), where the line width of the pattern at some positions is greater than the line width of the pattern at other positions on the masking layer. The liquid crystal panel and the photoresist pattern forming method therefor, by configuring different line widths for the pattern on the masking layer corresponding to different positions on the photoresist material layer on the panel, overcome the technical problem in the prior art in which differences are found in the line width of the photoresist pattern ultimately formed because solvent residues at different positions of the photoresist material layer on the entire substrate (100) are different and also a masking layer of a same line width is utilized for exposure to light.