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1. (WO2018140805) ACTIVATION OF WAFER PARTICLE DEFECTS FOR SPECTROSCOPIC COMPOSITION ANALYSIS

Pub. No.:    WO/2018/140805    International Application No.:    PCT/US2018/015570
Publication Date: Fri Aug 03 01:59:59 CEST 2018 International Filing Date: Sat Jan 27 00:59:59 CET 2018
IPC: H01L 21/66
Applicants: KLA-TENCOR CORPORATION
Inventors: HALLER, Kurt
Title: ACTIVATION OF WAFER PARTICLE DEFECTS FOR SPECTROSCOPIC COMPOSITION ANALYSIS
Abstract:
Methods and systems for detecting a particle defect on a wafer surface, transforming the particle to a spectroscopically active state, and identifying a material composition of the activated particle by a spectroscopic technique are described herein. Particle defects are transformed by chemical treatment, thermal treatment, photochemical treatment, or a combination thereof, such that an activated particle exhibits atomic vibrational bands that can be observed spectroscopically. In one embodiment, a surface inspection system detects the presence of a particle defect on a wafer surface, activates observable Raman bands in one or more of the detected particles, and identifies the material composition of the activated particle by a spectroscopic technique. By performing both defect detection and composition analysis on the same inspection tool, it is not necessary to transfer a wafer to a different review tool, or combination of tools, to perform composition analysis of particle defects deposited on semiconductor wafers.