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1. (WO2018140189) METHOD TO IMPROVE FILM QUALITY FOR PVD CARBON WITH REACTIVE GAS AND BIAS POWER

Pub. No.:    WO/2018/140189    International Application No.:    PCT/US2017/068538
Publication Date: Fri Aug 03 01:59:59 CEST 2018 International Filing Date: Thu Dec 28 00:59:59 CET 2017
IPC: H01L 21/02
Applicants: APPLIED MATERIALS, INC.
Inventors: CITLA, Bhargav
LIU, Jingjing
HUA, Zhong Qiang
YING, Chentsau
NEMANI, Srinivas D.
YIEH, Ellie Y.
Title: METHOD TO IMPROVE FILM QUALITY FOR PVD CARBON WITH REACTIVE GAS AND BIAS POWER
Abstract:
Embodiments of the present disclosure generally describe methods for depositing an amorphous carbon layer onto a substrate, including over previously formed layers on the substrate, using a high power impulse magnetron sputtering (HiPIMS) process, and in particular, biasing of the substrate during the deposition process and flowing a nitrogen source gas and/or a hydrogen source gas into the processing chamber in addition to an inert gas to improve the morphology and film stress of the deposited amorphous carbon layer.