Search International and National Patent Collections

1. (WO2018136579) CURRENT-INDUCED DARK LAYER FORMATION FOR METALLIZATION IN ELECTRONIC DEVICES

Pub. No.:    WO/2018/136579    International Application No.:    PCT/US2018/014135
Publication Date: Fri Jul 27 01:59:59 CEST 2018 International Filing Date: Fri Jan 19 00:59:59 CET 2018
IPC: H01L 27/12
H01L 29/786
H01L 21/02
G02F 1/1333
Applicants: H.C. STARCK INC.
Inventors: JALILI, Helia
DARY, Francois
COX, Barbara
Title: CURRENT-INDUCED DARK LAYER FORMATION FOR METALLIZATION IN ELECTRONIC DEVICES
Abstract:
In various embodiments, electronic devices such as thin-film transistors and/or touch-panel displays incorporate bilayers formed at least in part by anodization of metal-alloy base layers.