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1. (WO2018135540) GRAPHENE COMPOSITION, METHOD FOR PRODUCING SAME, AND CONDUCTIVE FILM
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Pub. No.: WO/2018/135540 International Application No.: PCT/JP2018/001258
Publication Date: 26.07.2018 International Filing Date: 17.01.2018
IPC:
C01B 32/19 (2017.01)
[IPC code unknown for C01B 32/19]
Applicants:
出光興産株式会社 IDEMITSU KOSAN CO.,LTD. [JP/JP]; 東京都千代田区丸の内三丁目1番1号 1-1, Marunouchi 3-chome, Chiyoda-ku, Tokyo 1008321, JP
Inventors:
近藤 浩史 KONDO, Hirofumi; JP
Agent:
特許業務法人平和国際特許事務所 HEIWA INTERNATIONAL PATENT OFFICE; 東京都千代田区神田須田町一丁目26番地 芝信神田ビル3階 Shibashin Kanda Bldg. 3rd Floor, 26, Kanda Suda-cho 1-chome, Chiyoda-ku, Tokyo 1010041, JP
Priority Data:
2017-00797919.01.2017JP
Title (EN) GRAPHENE COMPOSITION, METHOD FOR PRODUCING SAME, AND CONDUCTIVE FILM
(FR) COMPOSITION DE GRAPHÈNE, SA MÉTHODE DE PRODUCTION, ET FILM CONDUCTEUR
(JA) グラフェン組成物、その製造方法及び導電膜
Abstract:
(EN) A graphene composition including (a) single-layered graphene or two-or-more-layered graphene having an average thickness of 0.3-30 nm, (b) bubbles having an average diameter of 500 nm or less, and (c) a solvent which is water, an organic solvent, or a mixed solvent of water and an organic solvent.
(FR) L'invention concerne une composition de graphène comprenant (a) du graphène monocouche ou un graphène à deux couches ou plus ayant une épaisseur moyenne de 0,3 à 30 nm, (b) des bulles ayant un diamètre moyen de 500 nm ou moins, et (c) un solvant qui est de l'eau, un solvant organique, ou un solvant mixte d'eau et d'un solvant organique.
(JA) (a)平均厚さが0.3~30nmである、単層のグラフェン又は2層以上のグラフェン、(b)平均直径が500nm以下の気泡、及び(c)水、有機溶剤、又は水及び有機溶剤の混合溶剤である溶剤を含むグラフェン組成物。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)