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1. (WO2018134077) MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS OR AN INSPECTION SYSTEM

Pub. No.:    WO/2018/134077    International Application No.:    PCT/EP2018/050403
Publication Date: Fri Jul 27 01:59:59 CEST 2018 International Filing Date: Wed Jan 10 00:59:59 CET 2018
IPC: G02B 5/08
G02B 27/00
G03F 7/20
Applicants: CARL ZEISS SMT GMBH
HUBER, Peter
Inventors: HUBER, Peter
Title: MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS OR AN INSPECTION SYSTEM
Abstract:
The invention relates to a mirror, in particular for a microlithographic projection exposure apparatus or an inspection system, wherein the mirror comprises an optical active surface having a mirror substrate (205), a reflective layer (220) which is designed in such a way that the mirror possesses a reflectivity of at least 50% for electromagnetic radiation of a predetermined working wavelength that impinges on the optical active surface (200a) at an angle of incidence of at least 65° relative to the respective surface normal, and a braking layer system (210) which is disposed between the reflective layer (220) and the mirror substrate (205) and comprises an alternating sequence of layers made of a first material and at least one second material, wherein the braking layer system (210) reduces the penetration of hydrogen atoms to the mirror substrate (205) by at least a factor of 10 in comparison to an analogous design without the braking layer system (210).