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1. (WO2018134010) LITHOGRAPHIC APPARATUS AND METHOD
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Pub. No.: WO/2018/134010 International Application No.: PCT/EP2017/083212
Publication Date: 26.07.2018 International Filing Date: 18.12.2017
IPC:
G03F 7/20 (2006.01) ,G02B 7/18 (2006.01) ,G02B 26/08 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7
Mountings, adjusting means, or light-tight connections, for optical elements
18
for prisms; for mirrors
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
26
Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
08
for controlling the direction of light
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
BOUMAN, Willem, Jan; NL
GIJSBERTSEN, Arjan; NL
KLINKHAMER, Jacob, Fredrik, Friso; NL
DE KLERK, Johannes, Wilhelmus; NL
BASELMANS, Johannes, Jacobus, Matheus; NL
Agent:
PJANOVIC, Ilija; NL
Priority Data:
17151719.617.01.2017EP
Title (EN) LITHOGRAPHIC APPARATUS AND METHOD
(FR) APPAREIL ET PROCÉDÉ LITHOGRAPHIQUES
Abstract:
(EN) A device manufacturing method comprising providing a lithographic apparatus configured to project a radiation beam patterned by a reticle onto a target portion of a substrate; determining a lithographic error; determining a correction profile configured to reduce the lithographic error; and, applying the correction profile to the patterned radiation beam by actuating a deformable reflector configured to reflect the patterned radiation beam, the deformable reflector being.
(FR) L'invention concerne un procédé de fabrication de dispositif qui comprend la fourniture d'un appareil lithographique configuré pour projeter un faisceau de rayonnement modélisé par un réticule sur une partie cible d'un substrat; déterminer une erreur lithographique; déterminer un profil de correction configuré pour réduire l'erreur lithographique; et appliquer le profil de correction au faisceau de rayonnement à motifs en actionnant un réflecteur déformable configuré pour réfléchir le faisceau de rayonnement à motifs, le réflecteur déformable demeurant.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)