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1. (WO2018132859) METHOD FOR PRODUCING A MULTI-LAYER PLAIN BEARING ELEMENT

Pub. No.:    WO/2018/132859    International Application No.:    PCT/AT2018/060020
Publication Date: Fri Jul 27 01:59:59 CEST 2018 International Filing Date: Wed Jan 24 00:59:59 CET 2018
IPC: C23C 14/02
C23C 14/16
C23C 14/34
F16C 33/12
Applicants: MIBA GLEITLAGER AUSTRIA GMBH
Inventors: NAGL, Johann
Title: METHOD FOR PRODUCING A MULTI-LAYER PLAIN BEARING ELEMENT
Abstract:
The invention relates to a method for producing a multi-layer plain bearing element (1), according to which, in a chamber of a cathode sputtering installation a metal layer is deposited on a substrate by the cathode sputtering of at least one target, said method comprising the steps: a substrate is introduced into the chamber of the cathode sputtering installation; the surface of the substrate to be coated is ion etched by ion bombardment, whereby substrate particles are removed from the surface of the substrate; the metal layer is deposited on the substrate by the production of target particles from at least one target that is connected as the cathode, said particles settling on the substrate. in the ion etching of the substrate step, the target is connected as the anode and at least some of the substrate particles are deposited on the target. the polarity of the target is then reversed for the deposition of the metal layer on the surface of the substrate.