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1. (WO2018132846) MATERIALS AMD METHODS FOR BUFFERING ACTIVE CHLORINE SOLUTIONS
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Pub. No.: WO/2018/132846 International Application No.: PCT/US2018/013997
Publication Date: 19.07.2018 International Filing Date: 17.01.2018
IPC:
A01N 25/22 (2006.01) ,A01N 57/00 (2006.01) ,A01N 59/00 (2006.01)
[IPC code unknown for A01N 25/22][IPC code unknown for A01N 57][IPC code unknown for A01N 59]
Applicants:
PHARMOCON LLC [US/US]; 74 Oregon Road Ashland, MA 01721, US
Inventors:
O'CONNELL, John, F. Jr.; US
DEMERS, James, P.; US
RIDEOUT, Darryl, C.; US
Agent:
DEMERS, James, P.; US
Priority Data:
62/445,75413.01.2017US
Title (EN) MATERIALS AMD METHODS FOR BUFFERING ACTIVE CHLORINE SOLUTIONS
(FR) PROCÉDÉS ET MATÉRIELS POUR TAMPONNER DES SOLUTIONS DE CHLORE ACTIF
Abstract:
(EN) The invention provides buffers stable to oxidants, including chlorine and hypochlorous acid, which are usable in the pH range 3-7. The invention also provides stable, buffered solutions comprising hypochlorous acid, having a pH between 3 and 7, and disposable wiping articles impregnated with these solutions.
(FR) L'invention concerne des tampons stables vis-à-vis d'oxydants, comprenant du chlore et de l'acide hypochloreux, qui sont utilisables dans la plage de pH 3-7. L'invention concerne également des solutions tamponnées stables comprenant de l'acide hypochloreux, ayant un pH compris entre 3 et 7, et des articles d'essuyage jetables imprégnés de ces solutions.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)