Search International and National Patent Collections

1. (WO2018132805) METHODS OF FORMING MLD FILMS USING POLYOLS WITH LONG CARBON BACKBONES

Pub. No.:    WO/2018/132805    International Application No.:    PCT/US2018/013782
Publication Date: Fri Jul 20 01:59:59 CEST 2018 International Filing Date: Wed Jan 17 00:59:59 CET 2018
IPC: C23C 16/455
C23C 16/56
Applicants: ULTRATECH, INC.
Inventors: SOWA, Mark, J.
Title: METHODS OF FORMING MLD FILMS USING POLYOLS WITH LONG CARBON BACKBONES
Abstract:
Molecular layer deposition processes for forming organic or hybrid organic/inorganic thin films on a substrate in a reaction chamber that include: providing a pulse of a first vapor phase organic or metal-organic precursor containing a plurality of groups reactive towards hydroxyl groups such that some of the reactive groups react with hydroxyl groups on the substrate to form an organic or hybrid organic/inorganic thin film while leaving some reactive groups available for reaction with a subsequent second precursor pulse; removing excess first reactant and reaction byproducts; providing a pulse of a second vapor phase organic precursor containing a plurality of hydroxyl groups (polyol) such that some of the hydroxyl groups react with the reactive sites of the first precursor on the substrate to form an organic thin film while leaving some hydroxyl groups available for reaction with a subsequent first precursor pulse; and removing excess second reactant and reaction byproducts.