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1. (WO2018128740) REDUCING AN OPTICAL POWER OF A REFLECTED LIGHT BEAM
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Pub. No.: WO/2018/128740 International Application No.: PCT/US2017/064555
Publication Date: 12.07.2018 International Filing Date: 04.12.2017
IPC:
G02B 27/42 (2006.01) ,G02B 27/09 (2006.01) ,H01S 3/00 (2006.01) ,H01S 3/10 (2006.01) ,H05G 2/00 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
27
Other optical systems; Other optical apparatus
42
Diffraction optics
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
27
Other optical systems; Other optical apparatus
09
Beam shaping, e.g. changing the cross-sectioned area, not otherwise provided for
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
S
DEVICES USING STIMULATED EMISSION
3
Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
S
DEVICES USING STIMULATED EMISSION
3
Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
10
Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
G
X-RAY TECHNIQUE
2
Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
CONKLIN, Philip, M; US
STINSON, Cory, Alan; US
Agent:
NGUYEN, Joseph, A.; US
Priority Data:
15/402,13409.01.2017US
Title (EN) REDUCING AN OPTICAL POWER OF A REFLECTED LIGHT BEAM
(FR) RÉDUCTION DE LA PUISSANCE OPTIQUE D'UN FAISCEAU LUMINEUX RÉFLÉCHI
Abstract:
(EN) A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.
(FR) Selon la présente invention, un système destiné à une source de lumière ultraviolette extrême (EUV) comprend un système de génération de lumière configuré pour émettre au moins un faisceau lumineux sur un trajet de faisceau; au moins un amplificateur optique, chacun desdits amplificateurs comprenant un milieu de gain sur le trajet de faisceau, chaque milieu de gain étant configuré pour amplifier lesdits faisceaux lumineux afin de produire au moins un faisceau lumineux amplifié; et au moins un élément optique de diffraction sur le trajet de faisceau, chacun desdits éléments optiques de diffraction comprenant une pluralité de longueurs focales, et chaque longueur focale de l'élément optique de diffraction étant associée à un état de polarisation particulier.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)