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1. (WO2018128304) METHOD FOR MANUFACTURING MASK AND MOTHER PLATE USED THEREFOR
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Pub. No.: WO/2018/128304 International Application No.: PCT/KR2017/015061
Publication Date: 12.07.2018 International Filing Date: 20.12.2017
IPC:
C25D 7/06 (2006.01) ,C25D 5/02 (2006.01) ,C25D 5/50 (2006.01) ,H01L 51/00 (2006.01) ,H01L 51/56 (2006.01)
[IPC code unknown for C25D 7/06][IPC code unknown for C25D 5/02][IPC code unknown for C25D 5/50][IPC code unknown for H01L 51][IPC code unknown for H01L 51/56]
Applicants:
주식회사 티지오테크 TGO TECH. CORPORATION [KR/KR]; 경기도 용인시 기흥구 공세로 140-11 140-11, Gongse-ro, Giheung-gu Yongin-si Gyeonggi-do 17085, KR
Inventors:
이유진 LEE, Yoo Jin; KR
장택용 JANG, Taek Yong; KR
Agent:
김한 KIM, Han; KR
Priority Data:
10-2017-000143304.01.2017KR
Title (EN) METHOD FOR MANUFACTURING MASK AND MOTHER PLATE USED THEREFOR
(FR) PROCÉDÉ DE FABRICATION DE MASQUE ET PLAQUE MÈRE UTILISÉE POUR CELUI-CI
(KO) 마스크의 제조 방법 및 이에 사용되는 모판
Abstract:
(EN) The present invention relates to a method for manufacturing a mask and a mother plate used therefor. The method for manufacturing a mask according to the present invention, which is a method for manufacturing a mask (100 ) by electroforming, comprises the steps of: (a) providing a conductive substrate (21); (b) forming an insulating portion (26) patterned on one side of the conductive substrate (21) to manufacture a mother plate (20); (c) forming, by electroforming, a plating film (100) on the mother plate (20) which is used as a cathode body (20); (d) heat treating (H) the plating film (100); and (e) separating the plating film (100) from the mother plate (20).
(FR) La présente invention concerne un procédé de fabrication d’un masque et une plaque mère utilisée pour celui-ci. Le procédé de fabrication de masque selon la présente invention, qui est un procédé de fabrication d’un masque (100) par électroformage, comprend les étapes de : (a) fourniture d’un substrat conducteur (21) ; (b) formation d’une partie isolante (26) modelée sur un côté du substrat conducteur (21) pour fabriquer une plaque mère (20) ; (c) formation, par électroformage, d’un film de placage (100) sur la plaque mère (20) qui est utilisé en tant que corps de cathode (20) ; (d) traitement thermique (H) du film de placage (100) ; et (e) séparation du film de placage (100) de la plaque mère (20).
(KO) 본 발명은 마스크의 제조 방법 및 이에 사용되는 모판에 관한 것이다. 본 발명에 따른 마스크의 제조 방법은, 전주 도금(Electroforming)으로 마스크(100)를 제조하는 방법으로서, (a) 전도성 기재(21)를 제공하는 단계, (b) 전도성 기재(21)의 일면 상에 패턴화(26)된 절연부(26)를 형성하여 모판(Mother Plate; 20)을 제조하는 단계, (c) 모판(20)을 음극체(Cathode Body; 20)로 사용하고, 전주 도금(Electroforming)으로 모판(20) 상에 도금막(100)을 형성하는 단계, (d) 도금막(100)을 열처리(H)하는 단계, 및 (e) 모판(20)으로부터 도금막(100)을 분리하는 단계를 포함하는 것을 특징으로 한다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)