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1. (WO2018128235) POWER SUPPLY DEVICE FOR PLASMA GENERATION
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Pub. No.: WO/2018/128235 International Application No.: PCT/KR2017/007903
Publication Date: 12.07.2018 International Filing Date: 21.07.2017
IPC:
H01J 37/32 (2006.01) ,H05H 1/46 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
46
using applied electromagnetic fields, e.g. high frequency or microwave energy
Applicants:
주식회사 메디플 MEDIPL CO., LTD. [KR/KR]; 경기도 성남시 분당구 성남대로331번길 8, 903호 (정자동, 킨스타워) (Jeongja-dong, Kins Tower) 903, 8, Seongnam-daero 331beon-gil, Bundang-gu Seongnam-si Gyeonggi-do 13558, KR
Inventors:
박승진 PARK, Seung Jin; KR
권순구 KWON, Soon Ku; KR
Agent:
유미특허법인 YOU ME PATENT AND LAW FIRM; 서울시 강남구 테헤란로 115 115 Teheran-ro Gangnam-gu Seoul 06134, KR
Priority Data:
10-2017-000155304.01.2017KR
Title (EN) POWER SUPPLY DEVICE FOR PLASMA GENERATION
(FR) DISPOSITIF D'ALIMENTATION ÉLECTRIQUE POUR LA GÉNÉRATION DE PLASMA
(KO) 플라즈마 생성을 위한 전력 공급 장치
Abstract:
(EN) Disclosed is a power supply device for plasma generation, which is a power supply device for plasma generation which supplies a high frequency signal amplified to have energy for plasma generation, the power supply device comprising: a frequency generator for generating a signal having a frequency of the high frequency signal; a power amplifier for amplifying power of the signal generated from the frequency generator, and providing same to an output terminal of the power supply device; a power sensor for detecting forward power provided from the power amplifier to the output terminal, and reflected power reflected from a load, connected to the output terminal, to the output terminal; a voltage comparator for comparing the forward power and the reflected power detected by the power sensor, and generating a comparison value corresponding to the size of transmission power transferred from the power supply device to the load; and a voltage comparator for comparing the comparison value, generated by the voltage comparator, against a preconfigured reference voltage value, and, based on the result, controlling the size of a gain of the power amplifier.
(FR) L'invention concerne un dispositif d'alimentation électrique pour la génération de plasma, à savoir un dispositif d'alimentation électrique pour la génération de plasma qui fournit un signal haute fréquence amplifié pour disposer de l'énergie destinée à la génération de plasma, ce dispositif d'alimentation électrique comprenant : un générateur de fréquence destiné à générer un signal possédant une fréquence du signal haute fréquence ; un amplificateur de puissance destiné à amplifier la puissance du signal généré par le générateur de fréquence, et fournir celui-ci à une borne de sortie du dispositif d'alimentation électrique ; un capteur de puissance destiné à détecter une puissance directe fournie, de l'amplificateur de puissance à la borne de sortie, et une puissance réfléchie, d'une charge connectée à la borne de sortie vers la borne de sortie ; un comparateur de tension destiné à comparer la puissance directe et la puissance réfléchie détectée par le capteur de puissance, et à générer une valeur de comparaison correspondant à la grandeur de la puissance de transmission transférée du dispositif d'alimentation électrique à la charge ; et un comparateur de tension destiné à comparer la valeur de comparaison, générée par le comparateur de tension, à une valeur de tension de référence préconfigurée et, sur la base du résultat, à commander la grandeur d'un gain de l'amplificateur de puissance.
(KO) 플라즈마를 생성하기 위한 에너지를 갖도록 증폭된 고주파 신호를 공급하는 플라즈마 생성을 위한 전력 공급 장치로서, 상기 고주파 신호의 주파수를 갖는 신호를 생성하는 주파수 발생기; 상기 주파수 발생기에서 생성된 신호의 전력을 증폭하여 상기 전력 공급 장치의 출력단으로 제공하는 전력 증폭기; 상기 전력 증폭기로부터 상기 출력단으로 제공되는 순방향 전력과 상기 출력단에 연결된 부하로부터 상기 출력단으로 반사되는 반사 전력을 검출하는 전력 센서; 상기 전력 센서에서 검출된 상기 순방향 전력 및 상기 반사 전력을 비교하여 상기 전력 공급 장치에서 상기 부하로 전달되는 전송 전력의 크기에 대응되는 비교값을 생성하는 전압 비교기; 및 상기 전압 비교기에서 생성된 상기 비교값과 사전 설정된 기준 전압값을 비교하고 그 결과에 따라 상기 전력 증폭기의 이득의 크기를 제어하는 전압 비교기를 포함하는 플라즈마 생성을 위한 전력 공급 장치가 개시된다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)