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1. (WO2018128041) DEVICE FOR PRODUCING PARTICLES AND METHOD FOR PRODUCING PARTICLES
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Pub. No.: WO/2018/128041 International Application No.: PCT/JP2017/043831
Publication Date: 12.07.2018 International Filing Date: 06.12.2017
IPC:
B01J 2/04 (2006.01) ,B01D 1/18 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
J
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
2
Processes or devices for granulating materials, in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
02
by dividing the liquid material into drops, e.g. by spraying, and solidifying the drops
04
in a gaseous medium
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
1
Evaporating
16
by spraying
18
to obtain dry solids
Applicants:
大川原化工機株式会社 OHKAWARA KAKOHKI CO., LTD. [JP/JP]; 神奈川県横浜市都筑区池辺町3847 3847, Ikebe-cho, Tsuzuki-ku, Yokohama-shi, Kanagawa 2240053, JP
Inventors:
藤井 正嗣 FUJII Masashi; JP
設楽 勇城 SHITARA Yuki; JP
鈴木 忍 SUZUKI Shinobu; JP
Agent:
渡邉 一平 WATANABE Kazuhira; JP
Priority Data:
2017-00117706.01.2017JP
Title (EN) DEVICE FOR PRODUCING PARTICLES AND METHOD FOR PRODUCING PARTICLES
(FR) DISPOSITIF DE PRODUCTION DE PARTICULES ET PROCÉDÉ DE PRODUCTION DE PARTICULES
(JA) 粒子製造装置及び粒子製造方法
Abstract:
(EN) Provided is a device for producing particles capable of producing particles having a desired particle size and a narrow particle size distribution. A device 100 for producing particles comprises a rotary disk 10 having a plate-shaped portion 11 and a cylindrical portion 12 connected to the plate-shaped portion 11, and a raw material supply portion 20 disposed above the rotary disk 10 and having a raw material supply port 21 for supplying a raw material. In the raw material supply portion 20, a gas supply port 22 for supplying a gas is formed on the outer side of the raw material supply port 21, and the gas supplied from the gas supply port 22 directs the raw material supplied from the raw material supply port 21 so that the raw material hits the surface of the cylindrical portion 12.
(FR) L'invention concerne un dispositif de production de particules capables de produire des particules ayant une taille de particule souhaitée et une distribution de taille de particule étroite. Un dispositif 100 de production de particules comprend un disque rotatif 10 ayant une partie en forme de plaque 11 et une partie cylindrique 12 reliée à la partie en forme de plaque 11, et une partie d'alimentation en matière première 20 disposée au-dessus du disque rotatif 10 et ayant un orifice d'alimentation en matière première 21 pour fournir une matière première. Dans la partie d'alimentation en matière première 20, un orifice d'alimentation en gaz 22 pour fournir un gaz est formé sur le côté extérieur de l'orifice d'alimentation en matière première 21, et le gaz fourni par l'orifice d'alimentation en gaz 22 dirige la matière première fournie à partir de l'orifice d'alimentation en matière première 21 de telle sorte que la matière première frappe la surface de la partie cylindrique 12.
(JA) 所望の粒子径であって粒子径分布が狭い粒子を製造可能な粒子製造装置を提供する。板状部11とこの板状部11に連なる筒状部12とを有する回転盤10と、回転盤10の上方に配置され、原料を供給する原料供給口21が形成された原料供給部20と、を備え、原料供給部20には、気体を供給する気体供給口22が原料供給口21の外側に形成され、原料供給口21から供給された原料が筒状部12の表面に当たるように、気体供給口22から供給した気体が原料を方向付ける粒子製造装置100。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)