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1. (WO2018125201) SYNTHESIS OF POLYCARBOSILANES AND DERIVITIZATION TO HIGH DENSITY SIC FILL MATERIAL
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/125201 International Application No.: PCT/US2016/069465
Publication Date: 05.07.2018 International Filing Date: 30.12.2016
IPC:
H01L 21/20 (2006.01) ,H01L 21/18 (2006.01) ,H01L 21/02 (2006.01) ,H01L 21/768 (2006.01) ,H01L 21/762 (2006.01)
Applicants: INTEL CORPORATION[US/US]; 2200 Mission College Boulevard Santa Clara, California 95054, US
Inventors: MAHDI, Tayseer; US
BLACKWELL, James M.; US
TORRES, Jessica M.; US
BIELEFELD, Jeffery D.; US
PLOMBON, John J.; US
Agent: BRASK, Justin, K.; US
Priority Data:
Title (EN) SYNTHESIS OF POLYCARBOSILANES AND DERIVITIZATION TO HIGH DENSITY SIC FILL MATERIAL
(FR) SYNTHÈSE DE POLYCARBOSILANES ET DE DERIVITISATION EN MATÉRIAU DE REMPLISSAGE SIC HAUTE DENSITÉ
Abstract: front page image
(EN) A dielectric film, a device including a dielectric film and a method of forming a dielectric film on a integrated circuit substrate wherein the dielectric film includes cross-linked carbosilane units selected from linear monomer units or at least one linear monomer unit and at least one heterocyclic monomer unit, wherein the linear monomer units include a C2 to C8 straight or branched alkenyl or alkynyl and the at least one heterocyclic monomer unit includes a saturated or unsaturated moiety including an even numbered ring structure of alternating silicon and carbon atoms.
(FR) L'invention concerne un film diélectrique, un dispositif comprenant un film diélectrique et un procédé de formation d'un film diélectrique sur un substrat de circuit intégré, le film diélectrique comprenant des unités de carbosilane réticulé choisies parmi des unités monomères linéaires ou au moins une unité monomère linéaire et au moins une unité monomère hétérocyclique, les unités monomères linéaires comprenant un alcényle ou un alcynyle linéaire ou ramifié en C2 à C8 et l'au moins une unité monomère hétérocyclique comprenant une fraction saturée ou insaturée comprenant un nombre pair de structure cyclique d'atomes de silicium et de carbone alternés.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)