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1. (WO2018123924) COMPOSITION, MATERIAL FOR ORGANIC ELECTROLUMINESCENT ELEMENT, COMPOSITION FILM, ORGANIC ELECTROLUMINESCENT ELEMENT, AND ELECTRONIC DEVICE
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2018/123924 International Application No.: PCT/JP2017/046297
Publication Date: 05.07.2018 International Filing Date: 25.12.2017
IPC:
H01L 51/50 (2006.01) ,H05B 33/10 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
10
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
Applicants:
出光興産株式会社 IDEMITSU KOSAN CO.,LTD. [JP/JP]; 東京都千代田区丸の内三丁目1番1号 1-1, Marunouchi 3-chome, Chiyoda-ku, Tokyo 1008321, JP
Inventors:
河村 昌宏 KAWAMURA Masahiro; JP
岩渕 博之 IWABUCHI Hiroyuki; JP
水木 由美子 MIZUKI Yumiko; JP
熊 均 KUMA Hitoshi; JP
Agent:
特許業務法人樹之下知的財産事務所 KINOSHITA & ASSOCIATES; 東京都杉並区荻窪五丁目26番13号 3階 3rd Floor, 26-13, Ogikubo 5-chome, Suginami-ku, Tokyo 1670051, JP
Priority Data:
2016-25195926.12.2016JP
Title (EN) COMPOSITION, MATERIAL FOR ORGANIC ELECTROLUMINESCENT ELEMENT, COMPOSITION FILM, ORGANIC ELECTROLUMINESCENT ELEMENT, AND ELECTRONIC DEVICE
(FR) COMPOSITION, MATÉRIAU POUR ÉLÉMENT ÉLECTROLUMINESCENT ORGANIQUE, FILM DE COMPOSITION, ÉLÉMENT ÉLECTROLUMINESCENT ORGANIQUE, ET APPAREIL ÉLECTRONIQUE
(JA) 組成物、有機エレクトロルミネッセンス素子用材料、組成物膜、有機エレクトロルミネッセンス素子、及び電子機器
Abstract:
(EN) A composition in which two or more compounds are mixed, containing at least a first compound expressed by general formula (1) and a second compound expressed by general formula (2). In general formula (1), a total of six ring structures expressed in general formula (1a) are included in R1 to R4, A1, and A2. In general formula (2), at least one of A3 and A4 is a substituent expressed by general formula (2a), and the other is a substituent expressed by general formula (2b).
(FR) L’invention concerne une composition dans laquelle deux sortes de composé ou plus sont mélangées, et qui comprend au moins un premier composé représenté par la formule générale (1), et un second composé représenté par la formule générale (2). Dans la formule générale (1), R à R, A et A contiennent au total six structures cycliques représentées par la formule générale (1a). Dans la formule générale (2), A et/ouA est un substituant représenté par la formule générale (2a), l’autre étant un substituant représenté par la formule générale (2b).
(JA) 2種以上の化合物が混合された組成物であって、少なくとも下記一般式(1)で表される第一の化合物及び下記一般式(2)で表される第二の化合物が含有される組成物。ただし、一般式(1)において、R~R、A及びA中に、下記一般式(1a)で表される環構造は、合計で6つ含まれている。一般式(2)において、A及びAのうち少なくとも一方が、下記一般式(2a)で表される置換基であり、他方が(2b)で表される置換基である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)