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1. (WO2018123418) AIR FILTER MEDIUM
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Pub. No.: WO/2018/123418 International Application No.: PCT/JP2017/042984
Publication Date: 05.07.2018 International Filing Date: 30.11.2017
IPC:
B01D 39/14 (2006.01) ,A61L 9/16 (2006.01) ,B03C 3/28 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
39
Filtering material for liquid or gaseous fluids
14
Other self-supporting filtering material
A HUMAN NECESSITIES
61
MEDICAL OR VETERINARY SCIENCE; HYGIENE
L
METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION, OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICAL ARTICLES
9
Disinfection, sterilisation or deodorisation of air
16
using physical phenomena
B PERFORMING OPERATIONS; TRANSPORTING
03
SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
C
MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
3
Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
28
Plant or installations without electricity supply, e.g. using electrets
Applicants:
パナソニックIPマネジメント株式会社 PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. [JP/JP]; 大阪府大阪市中央区城見2丁目1番61号 1-61, Shiromi 2-chome, Chuo-ku, Osaka-shi, Osaka 5406207, JP
Inventors:
加藤 港 KATO Minato; --
小森 大輔 KOMORI Daisuke; --
大西 玄将 ONISHI Harunobu; --
辻 由浩 TSUJI Yoshihiro; --
稲垣 純 INAGAKI Jun; --
Agent:
鎌田 健司 KAMATA Kenji; JP
前田 浩夫 MAEDA Hiroo; JP
Priority Data:
2016-25034226.12.2016JP
Title (EN) AIR FILTER MEDIUM
(FR) MILIEU DE FILTRE À AIR
(JA) エアフィルタ濾材
Abstract:
(EN) Provided is an air filter medium (1) comprising a substrate layer (2) and a fine fiber layer (3) having electrostatic chargeability, the fine fiber layer (3) including a polymer material to which a hindered phenol-based light stabilizer and a benzotriazol-based light stabilizer are added. The polymer material has a volume resistivity of 1016Ωcm or more and a loss tangent of 0.001 or less. The air filter medium (1) is characterized in that when the weight of the hindered phenol-based light stabilizer is X, and the weight of the benzotriazol-based light stabilizer is Y, a relationship of 0 < (Y/X) ≤ 1.25 is satisfied.
(FR) L'invention concerne un milieu de filtre à air (1) comprenant une couche de substrat (2) et une couche de fibres fines (3) ayant une capacité de charge électrostatique, la couche de fibres fines (3) comprenant un matériau polymère auquel sont ajoutés un stabilisateur de lumière à base de phénol encombré et un stabilisateur de lumière à base de benzotriazol. Le matériau polymère a une résistivité volumique de 1016Ωcm ou plus et une tangente de perte de 0,001 ou moins. Le milieu de filtre à air (1) est caractérisé en ce que lorsque le poids du stabilisateur de lumière à base de phénol encombré est X, et que le poids du stabilisateur de lumière à base de benzotriazol est Y, une relation de 0 < (Y/X) ≤ 1.25 est satisfaite.
(JA) 基材層(2)と帯電性を有する細繊維層(3)とを備えたエアフィルタ濾材(1)であって、細繊維層(3)は、ヒンダードフェノール系光安定剤とベンゾトリアゾール系光安定剤とが添加された高分子材料を含む。高分子材料は、体積抵抗率が1016Ωcm以上であり、且つ、誘電正接が0.001以下である。ヒンダードフェノール系光安定剤の重量をX、ベンゾトリアゾール系光安定剤の重量をYとした場合に、0<(Y/X)≦1.25の関係を満たすことを特徴とする。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)