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1. (WO2018123388) RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND METAL-CONTAINING RESIN AND METHOD FOR MANUFACTURING SAME
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Pub. No.: WO/2018/123388 International Application No.: PCT/JP2017/042469
Publication Date: 05.07.2018 International Filing Date: 27.11.2017
IPC:
G03F 7/038 (2006.01) ,C08F 12/14 (2006.01) ,C08G 79/12 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/20 (2006.01) ,G03F 7/32 (2006.01) ,G03F 7/039 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
12
Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
02
Monomers containing only one unsaturated aliphatic radical
04
containing one ring
14
substituted by hetero atoms or groups containing hetero atoms
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
79
Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon
12
a linkage containing tin
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
30
Imagewise removal using liquid means
32
Liquid compositions therefor, e.g. developers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
Applicants:
JSR株式会社 JSR CORPORATION [JP/JP]; 東京都港区東新橋一丁目9番2号 9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo 1058640, JP
Inventors:
浅野 裕介 ASANO Yusuke; JP
中川 恭志 NAKAGAWA Hisashi; JP
峯岸 信也 MINEGISHI Shinya; JP
Agent:
天野 一規 AMANO Kazunori; JP
Priority Data:
2016-25689828.12.2016JP
Title (EN) RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND METAL-CONTAINING RESIN AND METHOD FOR MANUFACTURING SAME
(FR) COMPOSITION SENSIBLE AU RAYONNEMENT, PROCÉDÉ DE FORMATION DE MOTIFS, RÉSINE CONTENANT DU MÉTAL ET PROCÉDÉ DE FABRICATION ASSOCIÉ
(JA) 感放射線性組成物、パターン形成方法並びに金属含有樹脂及びその製造方法
Abstract:
(EN) The present invention is a radiation-sensitive composition used for extreme UV light or radiation beam exposure, the radiation-sensitive composition containing a first polymer and a solvent, wherein the radiation-sensitive composition is characterized in that: the first polymer has a first structural unit including one or more metal atoms and a carbon atom that is chemically bonded to the metal atom and that does not constitute an unsaturated bond; and at least one of the chemical bonds is a covalent bond. Preferably, all of the chemical bonds are covalent bonds. The metal atom is preferably tin, germanium, lead, or a combination thereof.
(FR) La présente invention concerne une composition sensible au rayonnement utilisée pour une exposition à un rayonnement ultraviolet extrême ou à un faisceau de rayonnement, la composition sensible au rayonnement contenant un premier polymère et un solvant, la composition sensible au rayonnement étant caractérisée en ce que : le premier polymère a une première unité structurale comprenant un ou plusieurs atomes métalliques et un atome de carbone qui est lié chimiquement à l'atome métallique et qui ne constitue pas une liaison insaturée; et au moins une des liaisons chimiques est une liaison covalente. De préférence, toutes les liaisons chimiques sont des liaisons covalentes. L'atome métallique est de préférence l'étain, le germanium, le plomb ou une combinaison de ceux-ci.
(JA) 本発明は、極端紫外線又は電子線露光に用いられ、第1重合体と溶媒とを含有する感放射線性組成物であって、上記第1重合体が、1又は複数の金属原子と、この金属原子に化学結合により結合している炭素原子であって不飽和結合を構成していない炭素原子とを含む第1構造単位を有し、上記化学結合のうちの少なくとも1つが共有結合であることを特徴とする。上記化学結合の全てが共有結合であることが好ましい。上記金属原子は、スズ、ゲルマニウム、鉛又はこれらの組み合わせであることが好ましい。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)