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1. (WO2018122003) ADJUSTMENT ASSEMBLY AND SUBSTRATE EXPOSURE SYSTEM COMPRISING SUCH AN ADJUSTMENT ASSEMBLY
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Pub. No.: WO/2018/122003 International Application No.: PCT/EP2017/082892
Publication Date: 05.07.2018 International Filing Date: 14.12.2017
IPC:
G03F 7/20 (2006.01) ,H01J 37/20 (2006.01) ,H01J 37/317 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
20
Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30
Electron-beam or ion-beam tubes for localised treatment of objects
317
for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
Applicants:
MAPPER LITHOGRAPHY IP B.V. [NL/NL]; Computerlaan 15 2628 XK DELFT, NL
Inventors:
PEIJSTER, Jerry Johannes Martinus; NL
Agent:
PETERS, Sebastian Martinus; NL
Priority Data:
15/396,03230.12.2016US
201810830.12.2016NL
Title (EN) ADJUSTMENT ASSEMBLY AND SUBSTRATE EXPOSURE SYSTEM COMPRISING SUCH AN ADJUSTMENT ASSEMBLY
(FR) ENSEMBLE DE RÉGLAGE ET SYSTÈME D'EXPOSITION DE SUBSTRAT COMPRENANT UN TEL ENSEMBLE DE RÉGLAGE
Abstract:
(EN) The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.
(FR) L'invention concerne un système d'exposition de substrat comprenant un cadre, un module de support de substrat destiné à supporter un substrat, un appareil d'exposition destiné à exposer ledit substrat et un ensemble de réglage destiné à régler la position de l'appareil d'exposition par rapport au module de support de substrat. L'ensemble de réglage comprend un actionneur hydraulique, un générateur hydraulique et un conduit. Le conduit interconnecte ledit actionneur hydraulique et ledit générateur hydraulique pour former un système hydraulique. L'appareil d'exposition, le cadre, l'ensemble de réglage et le module de support de substrat sont agencés en tant que parties d'une série de composants liés mécaniquement. Une première partie de ladite série de composants liés mécaniquement comprend l'appareil d'exposition, et une deuxième partie comprend le module de support de substrat. Ledit actionneur hydraulique est disposé entre ladite première partie et ladite deuxième partie De préférence, l'actionneur hydraulique comprend un premier soufflet et le générateur hydraulique comprend un deuxième soufflet.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)