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1. (WO2018121898) RF CAPACITIVE COUPLED ETCH REACTOR

Pub. No.:    WO/2018/121898    International Application No.:    PCT/EP2017/076506
Publication Date: Fri Jul 06 01:59:59 CEST 2018 International Filing Date: Wed Oct 18 01:59:59 CEST 2017
IPC: H01J 37/32
Applicants: EVATEC AG
Inventors: WEICHART, Johannes
WEICHART, Jürgen
Title: RF CAPACITIVE COUPLED ETCH REACTOR
Abstract:
In a capacitive coupled etch reactor, in which the smaller electrode is predominantly etched, the surface of the larger electrode is increased by a body e.g. a plate, which is on the same electric potential as the larger electrode and which is immersed in the plasma space. A pattern of openings in which plasma may burn is provided in the body so as to control the distribution of the etching effect on a substrate placed on the smaller electrode.