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1. (WO2018121896) RF CAPACITIVE COUPLED DUAL FREQUENCY ETCH REACTOR
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Pub. No.: WO/2018/121896 International Application No.: PCT/EP2017/076504
Publication Date: 05.07.2018 International Filing Date: 17.10.2017
IPC:
H01J 37/32 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
Applicants:
EVATEC AG [CH/CH]; Hauptstrasse 1a 9477 Trübbach, CH
Inventors:
WEICHART, Jürgen; LI
WEICHART, Johannes; LI
Agent:
TROESCH SCHEIDEGGER WERNER AG; Schwäntenmos 14 8126 Zumikon, CH
Priority Data:
00279/1708.03.2017CH
CH01750/1627.12.2016CH
Title (EN) RF CAPACITIVE COUPLED DUAL FREQUENCY ETCH REACTOR
(FR) RÉACTEUR DE GRAVURE À DOUBLE FRÉQUENCE À COUPLAGE CAPACITIF RF
(DE) RF CAPACITIVE COUPLED DUAL FREQUENCY ETCH REACTOR. PR1608
Abstract:
(EN) In a capacitively coupled etch reactor, in which the smaller electrode is etched, the larger electrode is electrically supplied by a very high frequency supply signal and by a high frequency supply signal. The smaller electrode, acting as a substrate carrier, is connected to ground potential.
(FR) Dans un réacteur de gravure à couplage capacitif, dans lequel l'électrode plus petite est gravée, l'électrode plus grande est alimentée électriquement par un signal d'alimentation à très haute fréquence et par un signal d'alimentation haute fréquence. L'électrode plus petite, agissant en tant que support de substrat, est connectée à un potentiel de masse.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)