Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2018120382) FINE MASK PLATE AND MANUFACTURING METHOD THEREOF
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/120382 International Application No.: PCT/CN2017/073882
Publication Date: 05.07.2018 International Filing Date: 17.02.2017
IPC:
C23C 14/04 (2006.01) ,C23C 14/24 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
Applicants:
武汉华星光电技术有限公司 WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN/CN]; 中国湖北省武汉市 东湖开发区高新大道666号生物城C5栋 Building C5, Biolake of Optics Valley, No.666 Gaoxin Avenue, Wuhan East Lake High-tech Development Zone Wuhan, Hubei 430070, CN
Inventors:
沐俊应 MU, Junying; CN
Agent:
深圳市德力知识产权代理事务所 COMIPS INTELLECTUAL PROPERTY OFFICE; 中国广东省深圳市 福田区上步中路深勘大厦15E Room 15E, Shenkan Building Shangbu Zhong Road, Futian District Shenzhen, Guangdong 518028, CN
Priority Data:
201611233974.X28.12.2016CN
Title (EN) FINE MASK PLATE AND MANUFACTURING METHOD THEREOF
(FR) PLAQUE DE MASQUE FINE ET SON PROCÉDÉ DE FABRICATION
(ZH) 精细掩膜板及其制作方法
Abstract:
(EN) A fine mask plate and a manufacturing method thereof are provided. The fine mask plate comprises a mask frame (15), a first mask formed of metal (11), and a second mask formed of an organic material (12). A plurality of first pixel openings (111) are formed on the first mask (11). One or more second pixel openings (121) are formed in each area of the second mask (12) respectively corresponding to one of the first pixel openings (111). Since the second pixel opening (121) formed in the area corresponding to one of the first pixel openings (111) is smaller than a conventional FMM in terms of pixel opening size, a smaller OLED device can be manufactured by the fine mask plate in a vacuum evaporation process, increasing the resolution of an OLED display product. In addition, since an opening wall slope of the second pixel opening (121) can be controlled to be smaller, an incidence angle of evaporation material at an edge of the second pixel opening (121) can be smaller in the vacuum evaporation process, reducing a coating film shadow region and increasing the resolution of the OLED display product.
(FR) La présente invention concerne une plaque de masque fine et un procédé de fabrication associé. La plaque de masque fine comprend un cadre de masque (15), un premier masque en métal (11), et un second masque en matériau organique (12). Une pluralité de premières ouvertures de pixel (111) sont formées sur le premier masque (11). Une ou plusieurs secondes ouvertures de pixel (121) sont formées dans chaque zone du second masque (12), correspondant respectivement à l'une des premières ouvertures de pixel (111). Étant donné que la seconde ouverture de pixel (121) formée dans la zone correspondant à l'une des premières ouvertures de pixel (111) est plus petite qu'un FMM classique en termes de taille d'ouverture de pixel, un dispositif OLED plus petit peut être fabriqué par la plaque de masque fine dans un procédé d'évaporation sous vide, augmentant la résolution d'un produit d'affichage OLED. De plus, étant donné qu'une pente de paroi d'ouverture de la seconde ouverture de pixel (121) peut être commandée pour être plus petite, un angle d'incidence du matériau d'évaporation au niveau d'un bord de la seconde ouverture de pixel (121) peut être plus petit dans le processus d'évaporation sous vide, réduisant une région d'ombre de film de revêtement et augmentant la résolution du produit d'affichage OLED.
(ZH) 一种精细掩膜板及其制作方法。精细掩膜板包括掩膜边框(15)、金属材料的第一掩膜(11)、及有机材料的第二掩膜(12);第一掩膜(11)上设有数个第一像素开孔(111);第二掩膜(12)上对应每一第一像素开孔(111)的区域内设有一个以上的第二像素开孔(121),由于第二像素开孔(121)对应设于对应第一像素开孔(111)的区域内,与现有的FMM相比,能够提供更小尺寸的像素开孔,从而能够用于真空蒸镀过程中制作更小尺寸的OLED器件,提高OLED显示产品的解析度;同时由于该第二像素开孔(121)的孔壁坡度可控制的更小,用于真空蒸镀过程中可使得蒸镀材料在第二像素开孔(121)边缘处的入射角度更小,从而能够减小镀膜阴影区域,进一步提高OLED显示产品的解析度。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)