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1. (WO2018119870) PHOTORESIST COATING PROCESS AND LOADING DEVICE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/119870 International Application No.: PCT/CN2016/112998
Publication Date: 05.07.2018 International Filing Date: 29.12.2016
IPC:
B05C 5/02 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
C
APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
5
Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
02
from an outlet device in contact, or almost in contact, with the work
Applicants: SHENZHEN ROYOLE TECHNOLOGIES CO., LTD.[CN/CN]; A4-1501, Kexing Science Park No.15 Keyuan Rd. Science and Technology Park, Nanshan District Shenzhen, Guangdong 518052, CN
Inventors: XU, Shunlong; CN
Agent: SHENZHEN ZHONGYI PATENT AND TRADEMARK OFFICE; 4th Fl. (PO Box No.5) Old Shenzhen Special Zone Newspaper Building No. 1014 Shennan Middle Road, Futian District Shenzhen, Guangdong 518028, CN
Priority Data:
Title (EN) PHOTORESIST COATING PROCESS AND LOADING DEVICE
(FR) PROCÉDÉ DE REVÊTEMENT PAR DE LA RÉSINE PHOTOSENSIBLE ET DISPOSITIF DE CHARGEMENT
(ZH) 光阻涂布工艺与载料装置
Abstract:
(EN) Provided are a photoresist coating process and a loading device, wherein the photoresist coating process comprises: providing a loading stage, and placing a substrate to be coated with a photoresist on the loading stage; coating the substrate with a magnetic photoresist material; and generating a magnetic field on one side of the substrate to divide the magnetic photoresist material into a conductive layer and a photoresist layer under the action of the magnetic field. The photoresist coating process and the loading device can reduce the photoresist coating process, improve efficiency, and reduce the manufacturing cost.
(FR) L'invention concerne un procédé de revêtement par de la résine photosensible et un dispositif de chargement, le procédé de revêtement par de la résine photosensible comprenant : utilisation d'un plateau de chargement et mise en place d'un substrat à revêtir d'une résine photosensible sur le plateau de chargement ; revêtement du substrat par un matériau de résine photosensible magnétique ; et génération d'un champ magnétique sur une face du substrat pour diviser le matériau de résine photosensible magnétique en une couche conductrice et en une couche de résine photosensible sous l'action du champ magnétique. Ce processus de revêtement par de la résine photosensible et ce dispositif de chargement peuvent permettre de réduire la durée du processus de revêtement par de la résine photosensible, améliorer l'efficacité et réduire le coût de fabrication.
(ZH) 一种光阻涂布工艺以及载料装置,其中,光阻涂布工艺包括:提供一载料台,并将待涂布光阻的衬底置于所述载料台上;将磁性光阻材料涂布在所述衬底上;以及在所述衬底的一侧产生磁场,所述磁性光阻材料在所述磁场的作用下分离为导电层与光阻层。采用该光阻涂布工艺与载料装置,能够减少光阻涂布制程的工序,提高效率,降低制造成本。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)