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1. (WO2018117832) METHOD FOR MANUFACTURING PHOTOVOLTAIC CELLS WITH A REAR SIDE POLYSILICON PASSIVATING CONTACT
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2018/117832 International Application No.: PCT/NL2017/050862
Publication Date: 28.06.2018 International Filing Date: 21.12.2017
IPC:
H01L 31/0368 (2006.01) ,H01L 31/068 (2012.01) ,H01L 31/18 (2006.01) ,H01L 31/0745 (2012.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
0248
characterised by their semiconductor bodies
036
characterised by their crystalline structure or particular orientation of the crystalline planes
0368
including polycrystalline semiconductors
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
04
adapted as conversion devices
06
characterised by at least one potential-jump barrier or surface barrier
068
the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
18
Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
04
adapted as conversion devices
06
characterised by at least one potential-jump barrier or surface barrier
072
the potential barriers being only of the PN heterojunction type
0745
comprising a AIVBIV heterojunction, e.g. Si/Ge, SiGe/Si or Si/SiC solar cells
Applicants:
NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO [NL/NL]; Anna van Buerenplein 1 2595 DA 's-Gravenhage, NL
Inventors:
GEERLIGS, Lambert Johan; NL
KOPPES, Martien; NL
WU, Yu; NL
STODOLNY, Maciej Krzyszto; NL
LENES, Martijn; NL
Agent:
NEDERLANDSCH OCTROOIBUREAU (NLO); P.O. Box 29720 2502 LS The Hague, NL
Priority Data:
201804222.12.2016NL
Title (EN) METHOD FOR MANUFACTURING PHOTOVOLTAIC CELLS WITH A REAR SIDE POLYSILICON PASSIVATING CONTACT
(FR) PROCÉDÉ DE FABRICATION DE CELLULES PHOTOVOLTAÏQUES AVEC CONTACT DE PASSIVATION DE POLYSILICIUM CÔTÉ ARRIÈRE
Abstract:
(EN) A method for manufacturing a photovoltaic cell from a substrate (2) having a front side (4), a back side (6) and an edge (8). A carrier selective contact structure (4a) of a first type is provided on at least a part of the front side (4). A stack (10) having a thin oxide layer covered by a polysilicon layer is applied, wherein the stack (10) is applied to the back side (6) and the front side (4) of the substrate (2), and possibly also on edge (8). The stack (10) of thin oxide layer and polysilicon layer on the front side (4) is then removed.
(FR) L'invention concerne un procédé de fabrication d'une cellule photovoltaïque à partir d'un substrat (2) ayant un côté avant (4), un côté arrière (6) et un bord (8). Une structure de contact sélective de support (4a) d'un premier type est disposée sur au moins une partie du côté avant (4). Un empilement (10) ayant une couche d'oxyde mince recouverte par une couche de polysilicium est appliqué, l'empilement (10) étant appliqué sur le côté arrière (6) et le côté avant (4) du substrat (2), et éventuellement également sur le bord (8). L'empilement (10) de la couche d'oxyde mince et de la couche de polysilicium sur le côté avant (4) est ensuite retiré.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)