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1. (WO2018106905) ANTI-REFLECTIVE SURFACE STRUCTURES FORMED USING THREE-DIMENSIONAL ETCH MASK

Pub. No.:    WO/2018/106905    International Application No.:    PCT/US2017/065093
Publication Date: Fri Jun 15 01:59:59 CEST 2018 International Filing Date: Fri Dec 08 00:59:59 CET 2017
IPC: G02B 1/12
G02B 1/113
Applicants: THE GOVERNMENT OF THE UNITED STATES OF AMERICA, as represented by THE SECRETARY OF THE NAVY
FRANTZ, Jesse, A.
BUSSE, Lynda, E.
SHAW, Leslie, Brandon
SANGHERA, Jasbinder, S.
AGGARWAL, Ishwar, D.
POUTOUS, Menelaos, K.
Inventors: FRANTZ, Jesse, A.
BUSSE, Lynda, E.
SHAW, Leslie, Brandon
SANGHERA, Jasbinder, S.
AGGARWAL, Ishwar, D.
POUTOUS, Menelaos, K.
Title: ANTI-REFLECTIVE SURFACE STRUCTURES FORMED USING THREE-DIMENSIONAL ETCH MASK
Abstract:
The invention relates to methods for fabricating antireflective surface structures (ARSS) on an optical element using a three-dimensional film layer applied to the surface of the optical element. The methods beneficially permit materials that do not exhibit local variation in physical and chemical properties to be provided with ARSS. Optical elements having ARSS on at least one surface are also provided.