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1. (WO2018106626) RUTHENIUM PRECURSORS FOR ALD AND CVD THIN FILM DEPOSITION AND USES THEREOF
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/106626    International Application No.:    PCT/US2017/064597
Publication Date: 14.06.2018 International Filing Date: 05.12.2017
IPC:
C07F 15/00 (2006.01), C23C 16/42 (2006.01), C23C 16/455 (2006.01), H01L 21/285 (2006.01), H01L 21/02 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054 (US)
Inventors: SCHMIEGE, Benjamin; (US).
ANTHIS, Jeffrey W.; (US).
THOMPSON, David; (US)
Agent: BLANKMAN, Jeffrey I.; (US)
Priority Data:
62/430,871 06.12.2016 US
Title (EN) RUTHENIUM PRECURSORS FOR ALD AND CVD THIN FILM DEPOSITION AND USES THEREOF
(FR) PRÉCURSEURS DE RUTHÉNIUM POUR DÉPÔT DE COUCHES MINCES ALD ET CVD, ET LEURS UTILISATIONS
Abstract: front page image
(EN)Metal coordination complexes comprising a metal atom coordinated to at least one diazabutadiene ligand having a structure represented by: where each R is independently a C1 -C13 alkyl or aryl group and each R' is independently H, C1 -C10 alkyl or aryl group are described. Processing methods using the metal coordination complexes are also described.
(FR)L'invention concerne des complexes de coordination métalliques comprenant un atome de métal coordonné à au moins un ligand de diazabutadiène ayant une structure représentée par : où chaque R représente indépendamment un groupe alkyle ou un groupe aryle en C1-C13 et chaque R' représente indépendamment H, un groupe alkyle ou un groupe aryle en C1-C10. L'invention concerne également des procédés de traitement utilisant les complexes de coordination métalliques.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)