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1. (WO2018106502) PARTICLE REDUCTION IN A PHYSICAL VAPOR DEPOSITION CHAMBER
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/106502    International Application No.:    PCT/US2017/063838
Publication Date: 14.06.2018 International Filing Date: 30.11.2017
IPC:
H01L 21/02 (2006.01), C23C 14/06 (2006.01), C23C 14/22 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054 (US)
Inventors: ZENG, Weimin; (US).
NGUYEN, Thanh X.; (US).
CAO, Yong; (US)
Agent: TABOADA, Alan; (US).
MOSER, JR., Raymond R.; (US).
LINARDAKIS, Leonard P.; (US)
Priority Data:
15/371,142 06.12.2016 US
Title (EN) PARTICLE REDUCTION IN A PHYSICAL VAPOR DEPOSITION CHAMBER
(FR) RÉDUCTION DE PARTICULES DANS UNE CHAMBRE DE DÉPÔT PHYSIQUE EN PHASE VAPEUR
Abstract: front page image
(EN)Methods and apparatus for reducing particles generated in a process carried out in a process chamber are provided herein. In some embodiments, a process kit shield includes: a body having a surface facing a processing volume of a physical vapor deposition (PVD) process chamber, wherein the body is composed of aluminum oxide (Al2O3); and a silicon nitride layer on the surface of the body.
(FR)L'invention concerne des procédés et un appareil permettant de réduire les particules générées dans un procédé mis en œuvre dans une chambre de traitement. Dans certains modes de réalisation, une protection de kit de traitement comprend : un corps ayant une surface faisant face à un volume de traitement d'une chambre de traitement de dépôt physique en phase vapeur (PVD), le corps étant composé d’oxyde aluminium (Al2O3); et une couche de nitrure de silicium sur la surface du corps.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)