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1. (WO2018105537) PHOTO LEWIS ACID GENERATOR
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Pub. No.: WO/2018/105537 International Application No.: PCT/JP2017/043372
Publication Date: 14.06.2018 International Filing Date: 01.12.2017
IPC:
C07F 5/02 (2006.01) ,C07D 213/20 (2006.01) ,C07D 213/22 (2006.01) ,C07D 213/30 (2006.01) ,C07D 215/10 (2006.01) ,C07D 309/34 (2006.01) ,C08G 59/68 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
5
Compounds containing elements of the 3rd Group of the Periodic System
02
Boron compounds
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
213
Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
02
having three double bonds between ring members or between ring members and non-ring members
04
having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
06
containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
16
containing only one pyridine ring
20
Quaternary compounds thereof
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
213
Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
02
having three double bonds between ring members or between ring members and non-ring members
04
having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
06
containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
22
containing two or more pyridine rings directly linked together, e.g. bipyridyl
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
213
Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
02
having three double bonds between ring members or between ring members and non-ring members
04
having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
24
with substituted hydrocarbon radicals attached to ring carbon atoms
28
Radicals substituted by singly-bound oxygen or sulfur atoms
30
Oxygen atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
215
Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
02
having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
04
with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to the ring carbon atoms
10
Quaternary compounds
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
309
Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
34
having three or more double bonds between ring members or between ring members and non-ring members
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
59
Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by reaction of epoxy polycondensates with monofunctional low-molecular-weight compounds; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
18
Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
68
characterised by the catalysts used
Applicants:
株式会社日本触媒 NIPPON SHOKUBAI CO., LTD. [JP/JP]; 大阪府大阪市中央区高麗橋4丁目1番1号 1-1, Koraibashi 4-chome, Chuo-ku, Osaka-shi, Osaka 5410043, JP
Inventors:
田中 智章 TANAKA, Tomoaki; JP
石田 知史 ISHIDA, Satoshi; JP
西田 俊文 NISHIDA, Toshifumi; JP
Agent:
岩谷 龍 IWATANI, Ryo; JP
Priority Data:
2016-23891608.12.2016JP
Title (EN) PHOTO LEWIS ACID GENERATOR
(FR) GÉNÉRATEUR DE PHOTO-ACIDE DE LEWIS
(JA) 光ルイス酸発生剤
Abstract:
(EN) Provided is a compound which is different from conventional photo acid generators and is capable of generating a Lewis acid by means of light. According to the present invention, this compound is composed of an anionic component that has a central boron atom and a specific cationic component (for example, a cation having a HOMO-LUMO gap of 5.3 eV or less). The cationic component may have, for example, a skeleton that is selected from among an N-substituted pyridinium skeleton, an N-substituted bipyridinium skeleton, an N-substituted quinolinium skeleton and a pyrylium skeleton.
(FR) L'invention concerne un composé qui est différent des générateurs de photo-acide classiques et qui est capable de générer un acide de Lewis par l'intermédiaire d'une lumière. Ce composé, selon la présente invention, est constitué d'un composant anionique qui a un atome de bore central et un composant cationique spécifique (par exemple, un cation ayant une bande interdite HOMO-LUMO de 5,3 eV ou moins). Le composant cationique peut avoir, par exemple, un squelette qui est choisi parmi un squelette pyridinium N-substitué, un squelette bipyridinium N-substitué, un squelette quinolinium N-substitué et un squelette pyrylium.
(JA) 従来の光酸発生剤とは異なり、光によりルイス酸を発生できる化合物を提供する。 化合物を、ホウ素を中心原子とするアニオン部と、特定のカチオン部(たとえば、HOMO-LUMO間のギャップが5.3eV以下のカチオン)とで構成する。カチオン部は、例えば、N-置換ピリジニウム骨格、N-置換ビピリジニウム骨格、N-置換キノリニウム、及びピリリウム骨格から選択された骨格を有していてもよい。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)