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Pub. No.:    WO/2018/105537    International Application No.:    PCT/JP2017/043372
Publication Date: 14.06.2018 International Filing Date: 01.12.2017
C07F 5/02 (2006.01), C07D 213/20 (2006.01), C07D 213/22 (2006.01), C07D 213/30 (2006.01), C07D 215/10 (2006.01), C07D 309/34 (2006.01), C08G 59/68 (2006.01)
Applicants: NIPPON SHOKUBAI CO., LTD. [JP/JP]; 1-1, Koraibashi 4-chome, Chuo-ku, Osaka-shi, Osaka 5410043 (JP)
Inventors: TANAKA, Tomoaki; (JP).
ISHIDA, Satoshi; (JP).
NISHIDA, Toshifumi; (JP)
Agent: IWATANI, Ryo; (JP)
Priority Data:
2016-238916 08.12.2016 JP
(JA) 光ルイス酸発生剤
Abstract: front page image
(EN)Provided is a compound which is different from conventional photo acid generators and is capable of generating a Lewis acid by means of light. According to the present invention, this compound is composed of an anionic component that has a central boron atom and a specific cationic component (for example, a cation having a HOMO-LUMO gap of 5.3 eV or less). The cationic component may have, for example, a skeleton that is selected from among an N-substituted pyridinium skeleton, an N-substituted bipyridinium skeleton, an N-substituted quinolinium skeleton and a pyrylium skeleton.
(FR)L'invention concerne un composé qui est différent des générateurs de photo-acide classiques et qui est capable de générer un acide de Lewis par l'intermédiaire d'une lumière. Ce composé, selon la présente invention, est constitué d'un composant anionique qui a un atome de bore central et un composant cationique spécifique (par exemple, un cation ayant une bande interdite HOMO-LUMO de 5,3 eV ou moins). Le composant cationique peut avoir, par exemple, un squelette qui est choisi parmi un squelette pyridinium N-substitué, un squelette bipyridinium N-substitué, un squelette quinolinium N-substitué et un squelette pyrylium.
(JA)従来の光酸発生剤とは異なり、光によりルイス酸を発生できる化合物を提供する。 化合物を、ホウ素を中心原子とするアニオン部と、特定のカチオン部(たとえば、HOMO-LUMO間のギャップが5.3eV以下のカチオン)とで構成する。カチオン部は、例えば、N-置換ピリジニウム骨格、N-置換ビピリジニウム骨格、N-置換キノリニウム、及びピリリウム骨格から選択された骨格を有していてもよい。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)