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1. (WO2018105478) PHOTOMASK FOR LIQUID CRYSTAL PHOTO-ALIGNMENT, PHOTO-ALIGNMENT DEVICE, AND PHOTO-ALIGNMENT METHOD
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Pub. No.: WO/2018/105478 International Application No.: PCT/JP2017/043009
Publication Date: 14.06.2018 International Filing Date: 30.11.2017
IPC:
G02F 1/1337 (2006.01)
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1337
Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
Applicants:
株式会社ブイ・テクノロジー V TECHNOLOGY CO., LTD. [JP/JP]; 神奈川県横浜市保土ヶ谷区神戸町134番地 134, Godo-cho, Hodogaya-ku, Yokohama-shi, Kanagawa 2400005, JP
シャープ株式会社 SHARP KABUSHIKI KAISHA [JP/JP]; 大阪府堺市堺区匠町1番地 1, Takumi-cho, Sakai-ku, Sakai-shi, Osaka 5908522, JP
Inventors:
吉田 祐治 YOSHIDA Yuji; JP
池田 聡 IKEDA Satoshi; JP
橋本 和重 HASHIMOTO Kazushige; JP
新井 敏成 ARAI Toshinari; JP
松本 一人 Matsumoto Kazuhito; JP
久保木 剣 KUBOKI Ken; JP
Agent:
特許業務法人 英知国際特許事務所 EICHI PATENT & TRADEMARK CORP.; 東京都文京区千石4丁目45番13号 45-13, Sengoku 4-chome, Bunkyo-ku, Tokyo 1120011, JP
Priority Data:
2016-23880808.12.2016JP
Title (EN) PHOTOMASK FOR LIQUID CRYSTAL PHOTO-ALIGNMENT, PHOTO-ALIGNMENT DEVICE, AND PHOTO-ALIGNMENT METHOD
(FR) PHOTOMASQUE POUR PHOTO-ALIGNEMENT DE CRISTAUX LIQUIDES, DISPOSITIF DE PHOTO-ALIGNEMENT ET PROCÉDÉ DE PHOTO-ALIGNEMENT
(JA) 液晶光配向用フォトマスク、光配向装置、光配向方法
Abstract:
(EN) The present invention proposes a photo-alignment method that does not require UV polarization. A photomask 1 for liquid crystal photo-alignment is provided with a plurality of slit openings 1A through which an alignment film is irradiated with light. The plurality of slit openings 1A are provided with a plurality of linear edges 1e that each form a boundary line between a light irradiation region and a light blocking region along a specific direction on the surface of the alignment film, and have a pitch interval P within which at least ultraviolet light is transmitted in a non-polarization state.
(FR) La présente invention concerne un procédé de photo-alignement qui ne nécessite pas de polarisation UV. Un photomasque (1) destiné au photo-alignement de cristaux liquides est pourvu d'une pluralité d'ouvertures en fente (1A) à travers lesquelles un film d'alignement est irradié avec de la lumière. La pluralité d'ouvertures en fente (1A) sont pourvues d'une pluralité de bords linéaires (1e) qui forment chacun une ligne de limite entre une région d'irradiation à la lumière et une région de blocage de lumière le long d'une direction spécifique sur la surface du film d'alignement, et possèdent un intervalle de pas P à l'intérieur duquel au moins la lumière ultraviolette est transmise dans un état de non-polarisation.
(JA) UV偏光を必要としない光配向法を提案する。液晶光配向用フォトマスク1は、配向膜に光を照射する複数のスリット開口部1Aを備え、複数のスリット開口部1Aは、配向膜表面に光照射領域と遮光領域との境界線を特定方向に沿って形成する複数の線状エッジ1eを備えると共に、少なくとも紫外光を無偏光状態で透過させるピッチ間隔Pを有する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)