WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Options
Query Language
Stem
Sort by:
List Length
Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2018105418) IMPRINT SYSTEM AND ARTICLE MANUFACTURING METHOD
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/105418 International Application No.: PCT/JP2017/042311
Publication Date: 14.06.2018 International Filing Date: 27.11.2017
IPC:
H01L 21/027 (2006.01) ,B29C 59/02 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
59
Surface shaping, e.g. embossing; Apparatus therefor
02
by mechanical means, e.g. pressing
Applicants: CANON KABUSHIKI KAISHA[JP/JP]; 30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo 1468501, JP
Inventors: YAMAMOTO, Kiyohito; JP
Agent: OHTSUKA, Yasunori; JP
OHTSUKA, Yasuhiro; JP
TAKAYANAGI, Jiro; JP
KIMURA, Shuji; JP
Priority Data:
2016-23977609.12.2016JP
Title (EN) IMPRINT SYSTEM AND ARTICLE MANUFACTURING METHOD
(FR) SYSTÈME D'IMPRESSION ET PROCÉDÉ DE FABRICATION D'UN ARTICLE
(JA) インプリントシステム、および物品製造方法
Abstract:
(EN) Provided is a replica manufacturing device which performs an imprint process for forming an imprint material pattern on a replica substrate using a master mold, fabricates a replica mold by processing the replica substrate with the pattern formed thereon, and transfers data relating to a condition concerning the imprint process to a management device. An imprint device acquires data from the management device, and performs an imprint process for forming an imprint material pattern on a substrate using the replica mold in accordance with the condition included in the acquired data.
(FR) L'invention concerne un dispositif de fabrication de réplique qui effectue un processus d'impression pour former un motif de matériau d'impression sur un substrat de réplique à l'aide d'un moule maître, fabrique un moule de réplique en traitant le substrat de réplique avec le motif formé sur celui-ci, et transfère les données relatives à une condition concernant le processus d'impression à un dispositif de gestion. Un dispositif d'impression acquiert les données à partir du dispositif de gestion, et effectue un processus d'impression pour former un motif de matériau d'impression sur un substrat à l'aide du moule de réplique conformément à la condition incluse dans les données acquises.
(JA) レプリカ製造装置は、マスターモールドを用いてレプリカ基板の上にインプリント材のパターンを形成するインプリント処理を行い、該パターンが形成されたレプリカ基板を加工することによりレプリカモールドを作製するとともに、インプリント処理に関する条件のデータを管理装置に転送する。インプリント装置は、管理装置からデータを取得し、該取得したデータに含まれる条件に従い、レプリカモールドを用いて基板の上のインプリント材のパターンを形成するインプリント処理を行う。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)