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1. (WO2018104073) METHOD AND APPARATUS FOR CONTROLLING A COMPUTING PROCESS
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/104073 International Application No.: PCT/EP2017/080324
Publication Date: 14.06.2018 International Filing Date: 24.11.2017
IPC:
G03F 7/20 (2006.01) ,G06F 17/50 (2006.01) ,G05B 19/418 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
F
ELECTRIC DIGITAL DATA PROCESSING
17
Digital computing or data processing equipment or methods, specially adapted for specific functions
50
Computer-aided design
G PHYSICS
05
CONTROLLING; REGULATING
B
CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
19
Programme-control systems
02
electric
418
Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control (DNC), flexible manufacturing systems (FMS), integrated manufacturing systems (IMS), computer integrated manufacturing (CIM)
Applicants: ASML NETHERLANDS B.V.[NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors: LU, Yen-Wen; US
CHEN, Xiaorui; US
LIN, Yang; NL
Agent: PETERS, John; NL
Priority Data:
62/432,52709.12.2016US
Title (EN) METHOD AND APPARATUS FOR CONTROLLING A COMPUTING PROCESS
(FR) PROCÉDÉ ET APPAREIL DE COMMANDE DE PROCESSUS INFORMATIQUE
Abstract:
(EN) A method of controlling a computer process for designing or verifying a photolithographic component includes building a source tree comprising nodes of the process, including dependency relationships among the nodes, defining, for some nodes, at least two different process conditions, expanding the source tree to form an expanded tree, including generating a separate node for each different defined process condition, and duplicating dependent nodes having an input relationship to each generated separate node, determining respective computing hardware requirements for processing the node, selecting computer hardware constraints based on capabilities of the host computing system, determining, based on the requirements and constraints and on dependency relations in the expanded tree, an execution sequence for the computer process, and performing the computer process on the computing system.
(FR) La présente invention concerne un procédé de commande d'un processus informatique pour concevoir ou vérifier un composant photolithographique, ledit procédé consistant à construire un arbre source comprenant des nœuds du processus, comprenant des relations de dépendance entre les nœuds, à définir, pour certains nœuds, au moins deux conditions de processus différentes, à développer l'arbre source afin de former un arbre étendu, comprenant la génération d'un nœud séparé pour chaque condition de processus définie différente, et à dupliquer des nœuds dépendants ayant une relation d'entrée à chaque nœud séparé généré, à déterminer des exigences de matériel informatique respectives pour traiter le nœud, à sélectionner des contraintes de matériel informatique sur la base des capacités du système informatique hôte, à déterminer, sur la base des exigences et des contraintes et des relations de dépendance dans l'arbre étendu, d'une séquence d'exécution pour le processus informatique, et à effectuer le processus informatique sur le système informatique.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)