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1. (WO2018104039) METHODS AND APPARATUS FOR PREDICTING PERFORMANCE OF A MEASUREMENT METHOD, MEASUREMENT METHOD AND APPARATUS

Pub. No.:    WO/2018/104039    International Application No.:    PCT/EP2017/079774
Publication Date: Fri Jun 15 01:59:59 CEST 2018 International Filing Date: Tue Nov 21 00:59:59 CET 2017
IPC: G03F 7/20
G01N 21/47
G03F 1/44
G01N 21/95
G01N 21/956
G03F 9/00
Applicants: ASML NETHERLANDS B.V.
Inventors: JAK, Martin, Jacobus, Johan
Title: METHODS AND APPARATUS FOR PREDICTING PERFORMANCE OF A MEASUREMENT METHOD, MEASUREMENT METHOD AND APPARATUS
Abstract:
An overlay measurement (OV) is based on asymmetry in a diffraction spectrum of target structures formed by a lithographic process. Stack difference between target structures can be perceived as grating imbalance (GI), and the accuracy of the overlay measurement may be degraded. A method of predicting GI sensitivity is performed using first and second images (45+, 45-) of the target structure using opposite diffraction orders. Regions (ROI) of the same images are used to measure overlay. Multiple local measurements of symmetry (S) and asymmetry (A) of intensity between the opposite diffraction orders are made, each local measurement of symmetry and asymmetry corresponding to a particular location on the target structure. Based on a statistical analysis of the local measurements of symmetry and asymmetry values, a prediction of sensitivity to grating imbalance is obtained. This can be used to select better measurement recipes, and/or to correct errors caused by grating imbalance.