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1. (WO2018104025) METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM, AND METHOD OF MEASURING A STRUCTURE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/104025    International Application No.:    PCT/EP2017/079491
Publication Date: 14.06.2018 International Filing Date: 16.11.2017
IPC:
G03F 7/20 (2006.01)
Applicants: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven (NL)
Inventors: PANDEY, Nitesh; (NL).
KOOLEN, Armand, Eugene, Albert; (NL)
Agent: BROEKEN, Petrus; (NL)
Priority Data:
16202927.6 08.12.2016 EP
Title (EN) METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM, AND METHOD OF MEASURING A STRUCTURE
(FR) APPAREIL DE MÉTROLOGIE, SYSTÈME LITHOGRAPHIQUE, ET PROCÉDÉ DE MESURE D'UNE STRUCTURE
Abstract: front page image
(EN)Metrology apparatus and methods for measuring a structure formed on a substrate by a lithographic process are disclosed. In one arrangement an optical system illuminates the structure with radiation and detects radiation scattered by the structure. The optical system comprises a first dispersive element (121). The first dispersive element spectrally disperses scattered radiation exclusively from a first portion (41) of a pupil plane field distribution along a first dispersion direction (56). A second dispersive element (122), separated from the first dispersive element, spectrally disperses scattered radiation exclusively from a second portion (42) of the pupil plane field distribution, different from the first portion of the pupil plane field distribution, along a second dispersion direction (57).
(FR)L'invention concerne un appareil de métrologie et des procédés de mesure d'une structure formée sur un substrat par un procédé lithographique. Dans un agencement, un système optique éclaire la structure avec un rayonnement et détecte un rayonnement diffusé par la structure. Le système optique comprend un premier élément dispersif (121). Le premier élément dispersif disperse spectralement le rayonnement diffusé exclusivement à partir d'une première partie (41) d'une distribution de champ de plan de pupille le long d'une première direction de dispersion (56). Un second élément dispersif (122), séparé du premier élément dispersif, disperse spectralement le rayonnement diffusé exclusivement à partir d'une seconde partie (42) de la distribution de champ de plan de pupille, différente de la première partie de la distribution de champ de plan de pupille, le long d'une seconde direction de dispersion (57).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)