Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2018102305) TRANSLATING AND ROTATING CHUCK FOR PROCESSING MICROELECTRONIC SUBSTRATES IN A PROCESS CHAMBER
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/102305 International Application No.: PCT/US2017/063486
Publication Date: 07.06.2018 International Filing Date: 28.11.2017
IPC:
H01L 21/687 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
687
using mechanical means, e.g. chucks, clamps or pinches
Applicants:
TEL FSI, INC. [US/US]; 3455 Lyman Boulevard Chaska, Minnesota 55318, US
Inventors:
HANZLIK, Edward Deneen; US
GRUENHAGEN, Michael; US
HERBST, Tim W.; US
Agent:
KAGAN, David, B.; US
BERGER, Scott A.; US
BINDER, Mark, W.; US
BJORKMAN, Dale, A.; US
BUSSE, Paul, B.; US
D'SOUZA, Tanya S.; US
HAKAMAKI, Michaele, A.; US
JIMENEZ, Jose, W.; US
PARINS, Paul, J.; US
SARAGENO, Lori P.; US
SCHULTE, Daniel, C.; US
WARNER, Elizabeth A.; US
WEAVER, Paul, L.; US
Priority Data:
62/427,75429.11.2016US
Title (EN) TRANSLATING AND ROTATING CHUCK FOR PROCESSING MICROELECTRONIC SUBSTRATES IN A PROCESS CHAMBER
(FR) MANDRIN DE TRANSLATION ET DE ROTATION PERMETTANT LE TRAITEMENT DE SUBSTRATS MICRO-ÉLECTRONIQUES DANS UNE CHAMBRE DE TRAITEMENT
Abstract:
(EN) Cleaning systems and methods for semiconductor fabrication use rotatable and translatable chuck assemblies that incorporate a compact drive system to cause chuck rotation. The system uses an offset drive gear that drives a ring gear. This reduces components whose friction or lubricants might generate undue contamination. The low friction chuck functionality of the present invention is useful in any fabrication tool in which a workpiece is supported on a rotating support during a treatment. The chuck is particularly useful in cryogenic cleaning treatments.
(FR) La présente invention concerne des systèmes et des procédés de nettoyage servant à la fabrication de semi-conducteurs et faisant appel à des ensembles mandrins qui peuvent tourner et effectuer une translation et qui intègrent un système d'entraînement compact destiné à entraîner le mandrin en rotation. Le système fait appel à un engrenage d'entraînement décalé qui entraîne une couronne. Ceci permet de réduire les composants dont le frottement ou les lubrifiants peuvent générer une contamination excessive. La fonctionnalité de mandrin à faible frottement de la présente invention est utile à tout outil de fabrication dans lequel une pièce à travailler est portée sur un support rotatif pendant un traitement. Le mandrin est particulièrement utile lors de traitements de nettoyage cryogéniques.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)