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1. (WO2018102270) POLYMERIC SYSTEMS FOR PARTICLE DISPERSION
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/102270 International Application No.: PCT/US2017/063354
Publication Date: 07.06.2018 International Filing Date: 28.11.2017
IPC:
C09K 8/88 (2006.01) ,C09K 8/575 (2006.01)
Applicants: SHEN, Lingjuan[CN/US]; US (US)
QU, Qi[US/US]; US (US)
ZHOU, Jian[US/US]; US (US)
CADIX, Arnaud[FR/FR]; FR (US)
PABALAN, Ruela[US/US]; US (US)
KESAVAN, Subramanian[US/US]; US (US)
WILSON, David, James[GB/FR]; FR (US)
RHODIA OPERATIONS[FR/FR]; 25, rue de Clichy Paris 75009, FR
Inventors: SHEN, Lingjuan; US
QU, Qi; US
ZHOU, Jian; US
CADIX, Arnaud; FR
PABALAN, Ruela; US
KESAVAN, Subramanian; US
WILSON, David, James; FR
Agent: KLOSEK, Sarah; US
PACHO, Jericho; US
Priority Data:
62/427,24629.11.2016US
Title (EN) POLYMERIC SYSTEMS FOR PARTICLE DISPERSION
(FR) SYSTÈMES POLYMÈRES POUR DISPERSION PARTICULAIRE
Abstract:
(EN) The present disclosure provides polymeric systems useful for maintaining particle dispersions for extended periods of time.
(FR) La présente invention concerne des systèmes polymères permettant de conserver des dispersions particulaires pendant des périodes prolongées.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)