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1. (WO2018101713) METHOD FOR MANUFACTURING POLYMER FILM
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/101713 International Application No.: PCT/KR2017/013731
Publication Date: 07.06.2018 International Filing Date: 29.11.2017
IPC:
C08J 5/22 (2006.01) ,H01L 21/027 (2006.01) ,H01L 21/311 (2006.01) ,G03F 1/00 (2006.01) ,C08F 220/18 (2006.01) ,C08F 220/22 (2006.01) ,C08F 297/02 (2006.01) ,C08F 220/44 (2006.01) ,C08F 220/38 (2006.01)
Applicants: LG CHEM, LTD.[KR/KR]; 128, Yeoui-daero, Yeongdeungpo-gu, Seoul 07336, KR
Inventors: RYU, Hyung Ju; KR
KU, Se Jin; KR
LEE, Mi Sook; KR
YOON, Sung Soo; KR
PARK, No Jin; KR
KIM, Jung Keun; KR
LEE, Je Gwon; KR
CHOI, Eun Young; KR
Agent: DANA PATENT LAW FIRM; 5th Floor, New Wing, Gwangsung Bldg., 11, Yeoksam-ro 3-gil, Gangnam-gu, Seoul 06242, KR
Priority Data:
10-2016-016212930.11.2016KR
Title (EN) METHOD FOR MANUFACTURING POLYMER FILM
(FR) PROCÉDÉ DE FABRICATION DE FILM POLYMÈRE
(KO) 고분자막의 제조 방법
Abstract: front page image
(EN) The present application relates to a method for manufacturing a polymer film. The present application relates to a manufacturing method for effectively forming a polymer film comprising, on a substrate, highly-aligned block copolymers having no orientation defects, coordination number defects, distance defects, and the like, and can provide a method for manufacturing a polymer film, which can be effectively applied to the production of various patterned substrates, and a method for manufacturing a patterned substrate by using the same.
(FR) La présente invention concerne un procédé de fabrication d'un film polymère. La présente invention concerne un procédé de fabrication permettant de former efficacement un film polymère comprenant, sur un substrat, des copolymères séquencés hautement alignés ne présentant pas de défauts d'orientation, de défauts de nombre de coordination, de défauts de distance et analogues, et de fournir un procédé de fabrication d'un film polymère, pouvant être efficacement appliqué à la production de divers substrats à motifs, et un procédé de fabrication d'un substrat à motifs à l'aide de celui-ci.
(KO) 본 출원은 고분자막의 제조 방법에 관한 것이다. 본 출원은, 기판상에 배향 결함, 배위수 결함, 거리 결함 등이 없는 고도로 정렬된 블록 공중합체를 포함하는 고분자막을 효과적으로 형성할 수 있는 제조 방법으로서, 다양한 패턴화 기판의 제조에 효과적으로 적용될 수 있는 고분자막의 제조 방법 및 그를 사용한 패턴화 기판의 제조 방법을 제공할 수 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)