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1. (WO2018101416) METHOD FOR MANUFACTURING SULFUR-CONTAINING ORGANIC SILICON COMPOUND
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/101416 International Application No.: PCT/JP2017/043100
Publication Date: 07.06.2018 International Filing Date: 30.11.2017
IPC:
C07F 7/08 (2006.01) ,B01J 31/22 (2006.01) ,C07F 15/00 (2006.01) ,C07B 61/00 (2006.01)
Applicants: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY[JP/JP]; 3-1, Kasumigaseki 1-chome, Chiyoda-ku, Tokyo 1008921, JP
Inventors: NAKAJIMA, Yumiko; JP
VENU, Srinivas; JP
SHIMADA, Shigeru; JP
SATO, Kazuhiko; JP
Agent: HIRAKAWA, Akira; JP
SANUKI, Shinichi; JP
Priority Data:
2016-23536202.12.2016JP
Title (EN) METHOD FOR MANUFACTURING SULFUR-CONTAINING ORGANIC SILICON COMPOUND
(FR) PROCÉDÉ DE FABRICATION DE COMPOSÉ DE SILICIUM ORGANIQUE CONTENANT DU SOUFRE
(JA) イオウ含有有機ケイ素化合物の製造方法
Abstract: front page image
(EN) In the present invention, a sulfur-containing organic silicon compound is obtained by efficient hydrosilylation of an alkene having a sulfur functional group such as represented by formula (B-1) or formula (B-2) in the presence of an iridium complex. (In formulas (B-1) and (B-2), R4 represents a C1-20 alkyl group, a C3-20 cycloalkyl group, a C6-20 aryl group, a C1-20 acyl group, or a C1-20 acyloxy group, m represents an integer of 1-5, and n represents an integer of 1-20.)
(FR) Dans la présente invention, un composé de silicium organique contenant du soufre est obtenu par hydrosilylation efficace d'un alcène ayant un groupe fonctionnel soufré tel que représenté par la formule (B-1) ou la formule (B-2) en présence d'un complexe d'iridium. (Dans les formules (B-1) et (B-2), R4 représente un groupe alkyle en C1-20, un groupe cycloalkyle en C3-20, un groupe aryle en C6-20, un groupe acyle en C1-20, ou un groupe acyloxy en C1-20, m représente un nombre entier de 1 à 5, et n représente un nombre entier de 1 à 20.)
(JA) イリジウム錯体の存在下で、式(B-1)や式(B-2)のようなイオウ官能基を有するアルケン類を効率よくヒドロシリル化してイオウ含有有機ケイ素化合物を得る。 (式(B-1)及び(B-2)中、R4は炭素原子数1~20のアルキル基、炭素原子数3~20のシクロアルキル基、炭素原子数6~20のアリール基、炭素原子数1~20のアシル基、又は炭素原子数1~20のアシロキシ基を、mは1~5の整数を、nは1~20の整数を表す。)
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)