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1. (WO2018101353) NEGATIVE PHOTOSENSITIVE COMPOSITION, ARTICLE CURED THEREFROM, AND METHOD FOR CURING SAID COMPOSITION
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Pub. No.: WO/2018/101353 International Application No.: PCT/JP2017/042877
Publication Date: 07.06.2018 International Filing Date: 29.11.2017
IPC:
G03F 7/004 (2006.01) ,G03F 7/027 (2006.01) ,G03F 7/038 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
Applicants:
株式会社ADEKA ADEKA CORPORATION [JP/JP]; 東京都荒川区東尾久七丁目2番35号 2-35, Higashiogu 7-chome, Arakawa-ku, Tokyo 1160012, JP
Inventors:
三原 大樹 MIHARA Taiki; JP
三宅 惇哉 MIYAKE Junya; JP
佐藤 直美 SATO Naomi; JP
Agent:
本多 一郎 HONDA Ichiro; JP
Priority Data:
2016-23352030.11.2016JP
Title (EN) NEGATIVE PHOTOSENSITIVE COMPOSITION, ARTICLE CURED THEREFROM, AND METHOD FOR CURING SAID COMPOSITION
(FR) COMPOSITION PHOTOSENSIBLE DE TYPE NÉGATIF, ET PRODUIT DURCI ASSOCIÉ AINSI QUE PROCÉDÉ DE FABRICATION DE CELUI-CI
(JA) ネガ型感光性組成物、その硬化物およびその硬化方法
Abstract:
(EN) Provided are a negative photosensitive composition that excels in sensitivity when cured and in the heat resistance of a cured article, an article cured from said composition, and a method for curing said composition. Included are a sulfonic acid derivative compound (A) expressed by general formula (I) (in general formula (I), X1 represents a C1-14 linear or branched alkyl group, etc., R1 represents a group represented by a C1-18 aliphatic hydrocarbon group, etc., and the C1-18 aliphatic hydrocarbon group, etc., in general formula (I) may not have a substituent or may be substituted by a group selected from a halogen atom, a C1-4 halogenated alkyl group, a C1-18 alkoxy group, and a C1-18 alkylthio group), a high molecular compound (B) having a crosslinkable functional group, and a crosslinking agent (C).
(FR) L’invention fournit une composition photosensible de type négatif excellente en termes de sensibilité lors de son durcissement et de résistance à la chaleur de produit durci, et un produit durci associé ainsi qu’un procédé de fabrication de celui-ci. La composition de l’invention comprend un composé de dérivé d’acide sulfonique (A) représenté par la formule générale (I) (dans la formule générale (I), X représente un groupe alkyle à chaîne droite ou à chaîne ramifiée de 1 à 14 atomes de carbone, R représente un groupe tel qu’un groupe hydrocarbure aliphatique de 1 à 18 atomes de carbone, ou similaire, le groupe hydrocarbure aliphatique de 1 à 18 atomes de carbone, ou similaire, dans la formule générale (I) ne présente pas de substituant, ou peut être substitué par un groupe choisi parmi un atome d’halogène, un groupe alkyle halogéné de 1 à 4 atomes de carbone, un groupe alkoxy de 1 à 18 atomes de carbone et un groupe alkylthio de 1 à 18 atomes de carbone), un composé polymère (B) possédant un groupe fonctionnel réticulable, et un agent de réticulation (C).
(JA) 硬化時の感度および硬化物の耐熱性に優れたネガ型感光性組成物、その硬化物およびその硬化方法を提供する。 下記一般式(I)、 (一般式(I)中、Xは炭素原子数1~14の直鎖または分岐鎖アルキル基等を表し、Rは、炭素原子数1~18の脂肪族炭化水素基等で表される基を表し、一般式(I)中の炭素原子数1~18の脂肪族炭化水素基等は、置換基を有しないか、ハロゲン原子、炭素原子数1~4のハロゲン化アルキル基、炭素原子数1~18のアルコキシ基および炭素原子数1~18のアルキルチオ基から選ばれる基で置換されていてもよい。)で表されるスルホン酸誘導体化合物(A)と、架橋性官能基を有する高分子化合物(B)と、架橋剤(C)と、を含有する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)