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1. (WO2018101204) POLARIZING PLATE AND METHOD FOR MANUFACTURING POLARIZING PLATE
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Pub. No.: WO/2018/101204 International Application No.: PCT/JP2017/042396
Publication Date: 07.06.2018 International Filing Date: 27.11.2017
IPC:
G02B 5/30 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
30
Polarising elements
Applicants:
日本ゼオン株式会社 ZEON CORPORATION [JP/JP]; 東京都千代田区丸の内一丁目6番2号 6-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008246, JP
Inventors:
眞島 啓 MASHIMA, Hiromu; JP
Agent:
特許業務法人酒井国際特許事務所 SAKAI INTERNATIONAL PATENT OFFICE; 東京都千代田区霞が関3丁目8番1号 虎の門三井ビルディング Toranomon Mitsui Building, 8-1, Kasumigaseki 3-chome, Chiyoda-ku, Tokyo 1000013, JP
Priority Data:
2016-23326630.11.2016JP
Title (EN) POLARIZING PLATE AND METHOD FOR MANUFACTURING POLARIZING PLATE
(FR) PLAQUE POLARISANTE ET PROCÉDÉ POUR FABRIQUER UNE PLAQUE POLARISANTE
(JA) 偏光板、及び、偏光板の製造方法
Abstract:
(EN) This polarizing plate is provided with a polarizer and a protective film layer formed on at least one surface of the polarizer, wherein the protective film layer is formed of a protective resin having a volatile component content of 0.03 wt% or less, and thus the thickness d of the protective film layer satisfies Equation (1): 0.01 μm ≤ d ≤ 0.5 μm.
(FR) La plaque polarisante selon l'invention est pourvue d'un polariseur et d'une couche de film de protection formée sur au moins une surface du polariseur, la couche de film de protection étant formée d'une résine de protection ayant une teneur en composant volatil de 0,03 % en poids ou moins, et ainsi l'épaisseur d de la couche de film protecteur satisfaisant à l'équation (1) : 0,01 μm ≤ d ≤ 0,5 µm.
(JA) 偏光子と、前記偏光子の少なくとも一方の面に形成された保護フィルム層とを備え、前記保護フィルム層が、揮発成分量0.03重量%以下の保護樹脂で形成されていて、前記保護フィルム層の厚みdが、式(1): 0.01μm ≦ d ≦ 0.5μm (1) を満たす、偏光板。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)