Search International and National Patent Collections
|1. (WO2018101154) LASER IRRADIATION DEVICE AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR|
|Applicants:||V TECHNOLOGY CO., LTD.
|Title:||LASER IRRADIATION DEVICE AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR|
The laser irradiation device according to one embodiment of the present invention is provided with: a light source that generates a laser beam; a projection lens for irradiating a predetermined region of an amorphous silicon thin film with the laser beam, said amorphous silicon thin film being adhered to each of a plurality of thin film transistors on a glass substrate; and a projection mask pattern, which is provided on the projection lens, and which includes a plurality of masks, in which transmissivities, i.e., the rates at which the laser beam passes through, are set. Through each of the masks included in the projection mask pattern, the projection lens applies the laser beam to the thin film transistors on the glass substrate moving in the predetermined direction, and in each of the masks included in the projection mask pattern, any one of the transmissivities is set.