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1. (WO2018101026) GAS BARRIER FILM
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Pub. No.: WO/2018/101026 International Application No.: PCT/JP2017/040899
Publication Date: 07.06.2018 International Filing Date: 14.11.2017
IPC:
B32B 9/00 (2006.01) ,C23C 16/42 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
C CHEMISTRY; METALLURGY
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COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
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characterised by the deposition of inorganic material, other than metallic material
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Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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Silicides
Applicants:
コニカミノルタ株式会社 KONICA MINOLTA, INC. [JP/JP]; 東京都千代田区丸の内二丁目7番2号 2-7-2, Marunouchi, Chiyoda-ku, Tokyo 1007015, JP
Inventors:
宮▲崎▼ 美帆 MIYAZAKI Miho; JP
Agent:
特許業務法人信友国際特許事務所 SHIN-YU INTERNATIONAL PATENT FIRM; 東京都渋谷区笹塚2-1-6 笹塚センタービル Sasazuka Center Bldg., 2-1-6, Sasazuka, Shibuya-ku, Tokyo 1510073, JP
Priority Data:
2016-23264430.11.2016JP
Title (EN) GAS BARRIER FILM
(FR) FILM BARRIÈRE CONTRE LES GAZ
(JA) ガスバリア性フィルム
Abstract:
(EN) A gas barrier film is provided in which a gas barrier layer has a carbon distribution curve with four or more maximum values, where a value of [film thickness/number of maximum values] is 25 nm or less. When the composition of the gas barrier layer is expressed as SiOxCy, a total of a region having the composition where y < 0.20 and a region having the composition where y > 1.40 is less than 20 nm in a thickness direction. Standard deviations (σ) of the gas barrier film [A] having not been subjected to expansion processing and the gas barrier film [B] having been subjected to a 2% expansion processing both satisfy [σ < 0.30].
(FR) Film barrière contre les gaz dans lequel une couche barrière contre les gaz présente une courbe de distribution de carbone ayant quatre valeurs maximales ou plus, une valeur de [épaisseur de film/nombre de valeurs maximales] étant de 25 nm ou moins. Lorsque la composition de la couche barrière contre les gaz est exprimée en SiOxCy, un total d'une région ayant la composition où y < 0,20 et une région ayant la composition où y > 1,40 est inférieur à 20 nm dans une direction d'épaisseur. Des écarts standard (σ) du film barrière contre les gaz [A] n'ayant pas été soumis à un traitement d'expansion et du film barrière contre les gaz [B] ayant été soumis à un traitement d'expansion à 2 % satisfont tous les deux à [σ < 0,30].
(JA) ガスバリア層の炭素分布曲線が4個以上の極大値を有し、[膜厚/極大値数]が25nm以下であり、ガスバリア層の組成をSiOxCyで表した際に、y<0.20の組成を有する領域とy>1.40の組成を有する領域との合計が厚さ方向に20nm未満であり、伸長処理を施していない前記ガスバリア性フィルム[A]と、2%の伸長処理を施した前記ガスバリア性フィルム[B]の標準偏差(σ)が共に[σ<0.30]を満たす。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)