Search International and National Patent Collections

1. (WO2018100968) VALVE DEVICE, AND FLOW CONTROL METHOD AND SEMICONDUCTOR MANUFACTURING METHOD USING SAID VALVE DEVICE

Pub. No.:    WO/2018/100968    International Application No.:    PCT/JP2017/039732
Publication Date: Fri Jun 08 01:59:59 CEST 2018 International Filing Date: Fri Nov 03 00:59:59 CET 2017
IPC: F16K 1/00
F16K 7/14
F16K 31/122
H01L 21/205
F16K 31/02
Applicants: FUJIKIN INCORPORATED
株式会社フジキン
Inventors: YOSHIDA Toshihide
吉田 俊英
NAKATA Tomohiro
中田 知宏
SHINOHARA Tsutomu
篠原 努
INADA Toshiyuki
稲田 敏之
FUNAKOSHI Takashi
船越 高志
SATO Hidenobu
佐藤 秀信
YUHARA Tomoko
湯原 知子
Title: VALVE DEVICE, AND FLOW CONTROL METHOD AND SEMICONDUCTOR MANUFACTURING METHOD USING SAID VALVE DEVICE
Abstract:
[Problem] To provide a valve device having a widened range of flow rate control and improved versatility. [Solution] This valve device has: a valve body 10 for defining flow passages 12, 13; a diaphragm 20 provided to the valve body 10 so as to be capable of opening and closing the flow passages 12, 13; an operating member 40 for operating the diaphragm 20 so that the diaphragm 20 can move in opening and closing directions A1, A2 in which the diaphragm 20 opens and closes the flow passages 12, 13; a main actuator 60 for applying a drive force to the operating member 40, the drive force corresponding to operating pressure applied in the opening direction A1 or the closing direction of the opening and closing directions; and a switching mechanism capable of selectively switching, according to the magnitude of operating pressure, the position of the operating member 40 which defines the degree of opening of the flow passages, to a first open position P1 or a second open position P2, the first and second open positions P1, P2 being different from each other; and adjustment mechanisms 70, 80 capable of independently adjusting the first open position P1 and the second open position P2.