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1. (WO2018100932) ALUMINUM ALLOY SPUTTERING TARGET
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/100932 International Application No.: PCT/JP2017/038667
Publication Date: 07.06.2018 International Filing Date: 26.10.2017
IPC:
C23C 14/34 (2006.01) ,C22C 21/00 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
21
Alloys based on aluminium
Applicants:
株式会社コベルコ科研 KOBELCO RESEARCH INSTITUTE, INC. [JP/JP]; 兵庫県神戸市中央区脇浜海岸通1丁目5番1号 1-5-1, Wakinohama-kaigan-dori, Chuo-ku, Kobe-shi, Hyogo 6510073, JP
Inventors:
奥野 博行 OKUNO, Hiroyuki; --
松村 仁実 MATSUMURA, Hiromi; --
Agent:
鮫島 睦 SAMEJIMA, Mutsumi; JP
山尾 憲人 YAMAO, Norihito; JP
Priority Data:
2016-23206930.11.2016JP
Title (EN) ALUMINUM ALLOY SPUTTERING TARGET
(FR) CIBLE DE PULVÉRISATION D'ALLIAGE D'ALUMINIUM
(JA) アルミニウム合金スパッタリングターゲット
Abstract:
(EN) Provided is an aluminum alloy sputtering target characterized by comprising a total amount of 0.01-0.04 at.% of one or more elements selected from the group consisting of Ni, Cr, Fe, Co, and Cu, a total amount of 0.01-0.06 at.% of one or more elements selected from rare-earth elements except for La, and the remaining portion being Al and unavoidable impurities.
(FR) L'invention concerne une cible de pulvérisation d'alliage d'aluminium caractérisée en ce qu'elle comprend une quantité totale de 0,01 à 0,04 at. % d'un ou de plusieurs éléments choisis dans le groupe constitué par Ni, Cr, Fe, Co et Cu, une quantité totale de 0,01 à 0,06 at. % d'un ou de plusieurs éléments choisis parmi les éléments des terres rares à l'exception de La, et la partie restante étant de l'Al et des impuretés inévitables.
(JA) Ni、Cr、Fe、CoおよびCuからなる群から選択される少なくとも1種の元素を合計で0.01原子%~0.04原子%と、La以外の希土類元素から選択される少なくとも1種の元素を合計で0.01原子%~0.06原子%とを含み、残部がAlおよび不可避不純物であることを特徴とするアルミニウム合金スパッタリングターゲットである。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)