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1. (WO2018100342) VACUUM PUMPING ARRANGEMENT
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Pub. No.: WO/2018/100342 International Application No.: PCT/GB2017/053524
Publication Date: 07.06.2018 International Filing Date: 23.11.2017
IPC:
F04B 41/06 (2006.01) ,F04B 37/14 (2006.01) ,F04B 49/00 (2006.01) ,F04C 23/00 (2006.01) ,F04D 25/16 (2006.01)
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
04
POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
B
POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
41
Pumping installations or systems specially adapted for elastic fluids
06
Combinations of two or more pumps
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
04
POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
B
POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
37
Pumps specially adapted for elastic fluids and having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/-F04B35/187
10
for special use
14
to obtain high vacuum
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
04
POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
B
POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
49
Control of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for in, or of interest apart from, groups F04B1/-F04B47/196
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
04
POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
C
ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
23
Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
04
POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
D
NON-POSITIVE-DISPLACEMENT PUMPS
25
Pumping installations or systems specially adapted for elastic fluids
16
Combinations of two or more pumps
Applicants:
EDWARDS LIMITED [GB/GB]; Innovation Drive Burgess Hill Sussex RH15 9TW, GB
Inventors:
GALTRY, Michael; GB
BAILEY, Christopher Mark; GB
Agent:
RAWLINS, Kate; GB
Priority Data:
1620225.129.11.2016GB
Title (EN) VACUUM PUMPING ARRANGEMENT
(FR) AGENCEMENT DE POMPAGE À VIDE
Abstract:
(EN) A vacuum pumping arrangement (10), for use in a semiconductor fabrication assembly, comprises a first pump (12) which has a first inlet (14) and a first outlet (16). The first inlet (14) is fluidly connected to a first common pumping line (18). The first common pumping line (18) includes a plurality of first pumping line inlets (20) each of which is fluidly connectable to a least one process chamber (24) within a group (26) of process chambers that form a semiconductor fabrication tool (28). The vacuum pumping arrangement (10) also includes a reserve pump (30) which has a reserve inlet (32) and a reserve outlet (34). The reserve inlet (32) is selectively fluidly connectable to each process chamber (24) within the group (26) of process chambers that form the semiconductor fabrication tool (28). The vacuum pumping arrangement (10) additionally includes a controller which is configured to selectively fluidly isolate the pump (12) from one or more given process chambers (24) and selectively fluidly connect the reserve pump (30) with the said one or more given process chambers (24).
(FR) La présente invention concerne un agencement de pompage à vide (10), destiné à être utilisé dans un ensemble de fabrication de semi-conducteurs, et comprenant une première pompe (12) qui présente une première entrée (14) et une première sortie (16). La première entrée (14) est en communication fluidique avec une première conduite de pompage commune (18). La première conduite de pompage commune (18) comprend une pluralité de premières entrées de conduite de pompage (20) qui sont chacune aptes à être en communication fluidique avec au moins une chambre de traitement (24) dans un groupe (26) de chambres de traitement qui forment un outil de fabrication de semi-conducteurs (28). L'agencement de pompage à vide (10) comprend également une pompe de réserve (30) qui présente une entrée de réserve (32) et une sortie de réserve (34). L'entrée de réserve (32) est sélectivement apte à être en communication fluidique avec chaque chambre de traitement (24) à l'intérieur du groupe (26) de chambres de traitement qui forment l'outil de fabrication de semi-conducteurs (28). L'agencement de pompage à vide (10) comprend en outre un dispositif de commande qui est conçu pour isoler fluidiquement de manière sélective la pompe (12) d'une ou plusieurs chambres de traitement données (24) et mettre la pompe de réserve (30) en communication fluidique de manière sélective avec ladite ou lesdites chambres de traitement données (24).
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)