Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2018099698) PROCESS FOR THE MANUFACTURING OF TRIARVL-ORGANO BORATES
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/099698 International Application No.: PCT/EP2017/078416
Publication Date: 07.06.2018 International Filing Date: 07.11.2017
IPC:
C07F 1/02 (2006.01) ,C07F 3/02 (2006.01) ,C07F 5/02 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/029 (2006.01) ,G03F 7/035 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
1
Compounds containing elements of the 1st Group of the Periodic System
02
Lithium compounds
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
3
Compounds containing elements of the 2nd Group of the Periodic System
02
Magnesium compounds
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
5
Compounds containing elements of the 3rd Group of the Periodic System
02
Boron compounds
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
028
with photosensitivity-increasing substances, e.g. photoinitiators
029
Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
035
the binders being polyurethanes
Applicants:
COVESTRO DEUTSCHLAND AG [DE/DE]; Kaiser-Wilhelm-Allee 60 51373 Leverkusen, DE
Inventors:
RÖLLE, Thomas; DE
SATYANARAYANA, Ganugapati; IN
ROYCHOWDHURY, Sumana; IN
PATIL, Ravindra, Mahadev; IN
PILLAR, Anup, Krishnnan, Appukuttan; IN
Agent:
LEVPAT; Covestro AG, Gebäude 4825 51365 Leverkusen, DE
Priority Data:
16197986.909.11.2016EP
17185207.208.08.2017EP
Title (EN) PROCESS FOR THE MANUFACTURING OF TRIARVL-ORGANO BORATES
(FR) PROCÉDÉ DE FABRICATION DE TRIARYLE-ORGANO BORATES
(DE) PROCESS FOR THE MANUFACTURING OF TRIARYL-ORGANO BORATES
Abstract:
(EN) The invention relates to a process for the preparation of triaryl-organo borates from boronic ester and the use of these substances in photo initiator systems, photopolymer compositions comprising such photo initiator systems, a holographic medium comprising said photopolymer composition and the respective hologram.
(FR) L'invention concerne un procédé de préparation de triaryle-organo borates à partir d'ester boronique, ainsi que l'utilisation de ces substances dans des systèmes photo-initiateurs. L'invention concerne également des compositions photopolymères comprenant ces systèmes photo-initiateurs, un support holographique comprenant ladite composition photopolymère, ainsi que l'hologramme respectif.
(DE) COV 16 1 103-Foreign Countries - 19 - Process for the manufacturing of triaryl-organo borates A b s t r a c t The invention relates to a process for the preparation of triaryl-organo borates from boronic ester and the use of these substances in photo initiator systems, photopolymer compositions 5 comprising such photo initiator systems, a holographic medium comprising said photopoly- mer composition and the respective hologram.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)