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1. (WO2018099690) A METHOD TO CHANGE AN ETCH PARAMETER

Pub. No.:    WO/2018/099690    International Application No.:    PCT/EP2017/078288
Publication Date: Fri Jun 08 01:59:59 CEST 2018 International Filing Date: Tue Nov 07 00:59:59 CET 2017
IPC: G03F 7/20
H01L 21/30
H01L 21/67
H01L 21/66
Applicants: ASML NETHERLANDS B.V.
Inventors: VAN HAREN, Richard, Johannes, Franciscus
CALADO, Victor, Emanuel
VAN DIJK, Leon, Paul
WERKMAN, Roy
MOS, Everhardus, Cornelis
WILDENBERG, Jochem, Sebastiaan
JOCHEMSEN, Marinus
RAJASEKHARAN, Bijoy
JENSEN, Erik
URBANCZYK, Adam, Jan
Title: A METHOD TO CHANGE AN ETCH PARAMETER
Abstract:
A method to change an etch parameter of a substrate etching process, the method comprising: making a first measurement of a first metric associated with a structure on a substrate before being etched; making a second measurement of a second metric associated with a structure on a substrate after being etched; and changing the etch parameter based on a difference between the first measurement and the second measurement.