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|1. (WO2018099690) A METHOD TO CHANGE AN ETCH PARAMETER|
|Applicants:||ASML NETHERLANDS B.V.
|Inventors:||VAN HAREN, Richard, Johannes, Franciscus
CALADO, Victor, Emanuel
VAN DIJK, Leon, Paul
MOS, Everhardus, Cornelis
WILDENBERG, Jochem, Sebastiaan
URBANCZYK, Adam, Jan
|Title:||A METHOD TO CHANGE AN ETCH PARAMETER|
A method to change an etch parameter of a substrate etching process, the method comprising: making a first measurement of a first metric associated with a structure on a substrate before being etched; making a second measurement of a second metric associated with a structure on a substrate after being etched; and changing the etch parameter based on a difference between the first measurement and the second measurement.